Plasma-based processes for surface wettability modification

Langmuir

Volumn 22, Issue 7, 2006, Pages 3057-3061

  Lejeune, Michaël ^a   Lacroix, Lise Marie ^a   Brétagneol, Frédéric ^a   Valsesia, Andrea ^a   Colpo, Pascal ^a   Rossi, François ^a  

^a JOINT RESEARCH CENTRE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

SUPERHYDROPHOBIC BEHAVIOR;

DEPOSITION; HYDROPHOBICITY; PHOTORESISTS; PLASMA ETCHING; SILICON; SURFACE ROUGHNESS; SURFACES; WETTING;

PLASMA DEVICES;

SILICON;

ARTICLE; CHEMICAL PHENOMENA; CHEMISTRY; HYDROPHOBICITY; WETTABILITY;

HYDROPHOBIC AND HYDROPHILIC INTERACTIONS; HYDROPHOBICITY; SILICON; WETTABILITY;

EID: 33645528421     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la052515f     Document Type: Article

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