Growth mechanisms involved in the synthesis of smooth and microtextured films by acetylene magnetron discharges

Langmuir

Volumn 27, Issue 14, 2011, Pages 8913-8922

  De Vriendt, Valérie ^a   Miladinovic, Sasa M ^b   Colaux, Julien L ^a   Maseri, Fabrizio ^c   Wilkins, Charles L ^b   Lucas, Stéphane ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

^b UNIVERSITY OF ARKANSAS   (United States)

^c ARCELORMITTAL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE GAS; BULK STRUCTURE; DUTY CYCLES; FILAMENTARY PARTICLES; FILM STRUCTURE; FOURIER TRANSFORM MASS SPECTROMETRY; GASPHASE; GROWTH MECHANISMS; HYDROGENATED AMORPHOUS CARBON (A-C:H); LASER DESORPTION/IONIZATION; MAGNETRON DISCHARGES; MICROFLOWERS; PULSED DISCHARGE; UNBALANCED MAGNETRON;

ACETYLENE; AGGLOMERATION; AMORPHOUS CARBON; DESORPTION; FILM GROWTH; FOURIER TRANSFORMS; GASES; LIGHTING; MAGNETRONS; MASS SPECTROMETRY; RAMAN SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 79960264801     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la2003035     Document Type: Article

References (50)

1. Von Keudell, A.; Schwarz-Sellinger, T.; Jacob, W. J. Appl. Phys. Lett. 2001, 89, 2979
2. Robertson, J. Thin Solid Films 2000, 383, 81
3. Kimock, F. M.; Knapp, B. J. Surf. Coat. Technol. 1993, 56, 27
4. Yang, P.; Kwok, S. C. H.; Fu, R. K. Y.; Leng, Y. X.; Wang, J.; Wan, G. J.; Huang, N.; Leng, Y.; Chu, P. K. Surf. Coat. Technol. 2004, 177-178, 747
5. Koos, M.; Füle, M.; Veres, M.; Toth, S.; Pocsik, I. J. Non-Cryst. Solids 2002, 299-302, 852
6. Druz, B.; Zaritskiy, I.; Yevtukhov, Y.; Konchits, A.; Valakh, M.; Shanina, B.; Kolesnik, S.; Yanchuk, I.; Gromovoy, Y. Diamond Relat. Mater. 2004, 13, 1592
7. Valentini, L.; Kenny, J. M.; Mariotto, G.; Tosi, P. J. M. S. J. Mater. Sci. 2001, 36, 5295
8. Logothetidis, S. Appl. Phys. Lett. 1996, 69, 158
9. De Vriendt, V.; Maseri, F.; Nonet, A.; Lucas, S. Plasma Processes Polym. 2009, 6, S6
10. Favia, P.; Cicala, G.; Milella, A.; Palumbo, F.; Rossini, P.; d'Agostino, R. Surf. Coat. Technol. 2003, 169-170, 609
11. Fallon, P. J.; Veerasamy, V. S.; Davis, C. A.; Robertson, J.; Amaratunga, G. A. J.; Milne, W. I.; Koskinen, J. Phys. Rev. B 1993, 48, 4877
12. Ferrari, A. C.; Robertson, J. Phys. Rev. B 2000, 61, 14095
13. Lifshitz, Y. Diamond Relat. Mater. 1996, 3-5, 388
14. Robertson, J. Surf. Coat. Technol. 1992, 50, 185
15. Tsai, H.; Bogi, D. B. J. Vac. Sci. Technol., A 1997, 5, 3287
16. Chu, P. K.; Li, L. Mater. Chem. Phys. 2006, 96, 253
17. Nelson, B. N.; Schieber, L. J.; Barich, D. H.; Lubach, J. W.; Offerdahl, T. J.; Lewis, D. H.; Heinrich, J. P.; Munson, E. J. Solid State Nucl. Magn. Reson. 2006, 29, 204
18. Alexandrou, I.; Scheibe, H.-J.; Kiely, C. J.; Papworth, A. J.; Amaratunga, G. A. J.; Schultrich, B. Phys. Rev. B 1999, 60, 10903
19. Miladinović, S. M.; De Vriendt, V.; Robotham, S. A.; Maseri, F.; Lucas, S.; Wilkins, C. L. J. Am. Soc. Mass Spectrom. 2009, 21, 411
20. Thomsen, C.; Reich, S. Phys. Rev. Lett. 2000, 85, 5214
21. Ferrari, A. C. Diamond Relat. Mater. 2002, 11, 1053
22. Tamor, M. A.; Vassell, W. C. J. Appl. Phys. 1994, 76, 3823
23. McIver, R. T., Jr.; Hunter, R. I.; Bowers, W. D. Int. J. Mass Spectrom. Ion Processes 1985, 64, 67
24. Deschenaux, Ch.; Affolter, A.; Magni, D.; Hollenstein, Ch.; Fayet, P. J. Phys. D: Appl. Phys. 1999, 32, 1876
25. Retzko, I.; Friedrich, J. F.; Lippitz, A.; Unger, W. E. S. J. Electron Spectrosc. 2001, 121, 111
26. Stundzia, V.; Bílková, P.; Biederman, H.; Slavínská, D.; Hlídek, P. Vacuum 1998, 50, 23
27. Salis, S. R.; Gardiner, D. J.; Bowden, M.; Savage, J.; Rodway, D. Diamond Relat. Mater. 1996, 5, 589
28. Schwan, J.; Ulrich, S.; Batori, V.; Ehrhardt, H.; Silva, S. R. P. J. Appl. Phys. 1996, 80, 440
29. Veres, M.; Toth, S.; Füle, M.; Koos, M. J. Non-Cryst. Solids 2006, 352, 1348
30. Tuinstra, F.; Koenig, J. J. Chem. Phys. 1970, 53, 1126
31. Prawer, S.; Nugent, K. W.; Lifshitz, Y.; Lempert, G. D.; Grossmann, E.; Kulik, J.; Avigal, I.; Kalish, R. Diamond Relat. Mater. 1996, 5, 433
32. Robertson, J. Mater. Sci. Eng. R. 2002, 37, 129
33. McCarley, T. D.; McCarley, R. L.; Limbach, P. A. Anal. Chem. 1998, 70, 4376
34. Knochenmuss, R. Analyst 2006, 131, 966
35. Zenobi, R.; Knochenmuss, R. Mass Spectrom. Rev. 1998, 17, 337
36. Creasy, W. R.; Zimmerman, J. A.; Ruoff, R. S. J. Phys. Chem. 1993, 97, 973
37. Apicella, B.; Carpentieri, A.; Alfè, M.; Barbella, R.; Tregrossi, A.; Pucci, P.; Ciajolo, A. Proc. Combust. Inst. 2007, 31, 547
38. De Bleecker, K.; Bogaerts, A.; Goedheer, W. Phys. Rev. E 2006, 73, 026405
39. Lafleur, A. L.; Taghizadeh, K.; Howard, J. B.; Anacleto, J. F.; Quilliam, M. A. J. Am. Soc. Mass Spectrom. 1996, 7, 276
40. Violi, A.; D'Anna, A.; D'Alessio, A.; Sarofim, A. F. Chemosphere 2003, 51, 1047
41. Gudmundsson, J. T.; Alami, J.; Helmersson, U. Surf. Coat. Technol. 2002, 16, 240
42. Lieberman, M. A.; Lichtenberg, A. J. Principles of Plasma Discharges and Materials Processing; John Wiley and Sons: New York, 2005.
43. Lin, I.; Ying-Ju, L.; Wen-Tau, J.; Ming-Hua, C.; Hong-Yu, C. Vacuum 2002, 66, 285
44. Boufendi, L.; Bouchoule, A. Plasma Sources Sci. Technol. 1994, 3, 262
45. Samsonov, D.; Goree, J. J. Vac. Sci. Technol., A 1999, 17, 2835
46. Samsonov, D.; Goree, J. Phys. Rev. 1999, 59, 1047
47. Barkan, A.; Merlino, R. L. Phys. Plasma 1995, 2 (9) 3261
48. Witten, T. A.; Sander, L. M. Phys. Rev. Lett. 1981, 47, 1400
49. Huang, F. Y.; Kushner, M. J. J. Appl. Phys. 1997, 81, 5960-5965
50. Neyts, E.; Bogaerts, A.; van de Sanden, M. C. M. J. Phys.: Conf. Ser. 2007, 86, 012020