Nanocomposite and nanostructured films with plasma polymer matrix

Surface and Coatings Technology

Volumn 211, Issue , 2012, Pages 127-137

  Biederman, Hynek ^a   Kylian, Ondrej ^a   Drabik, Martin ^a   Choukourov, Andrei ^a   Polonskyi, Oleksandr ^a   Solar, Pavel ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Metal oxides; Nanoclusters; Nanocomposites; Nanostructures; Plasma polymer; Thin film

Indexed keywords

COMPLEX COMPOSITES; COSPUTTERING; METAL OXIDES; NANOSTRUCTURED FILMS; NANOSTRUCTURED SURFACE; PLASMA POLYMERS; POLYMER NANOCOMPOSITE; RF-SPUTTERING;

FILM PREPARATION; METALLIC COMPOUNDS; NANOCLUSTERS; NANOCOMPOSITES; NANOSTRUCTURES; PLASMA POLYMERIZATION; PLASMAS; THIN FILMS;

PLASMA DEPOSITION;

EID: 84868664028     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.09.011     Document Type: Article

References (73)

1. Boonthanom N., White M. Thin Solid Films 1974, 24:295.
2. Tkatchuk B.V., Marusii N.Y., Laurs E.P. Vysokomol. Soedin. 1973, A15:2046.
3. Kay E., Dilks A., Hetzler U. J. Macromol. Sci.-Chem. 1978, A12:1393.
4. Biederman H., Holland L. Nucl. Instrum. Methods 1983, 212:497.
5. Zaporotchenko V., Strunskus T., Greve H., Schürmann U., Takele H., Hanisch C., Chakravadhanula V.S.K., Ni N., Gerber A., Quandt E., Podschun R., Faupel F. Polym. Polym. Compos. 2008, 16:471.
6. Lamber, Wetjen S., Jaeger N.I. Phys. Rev. B 1995, 51:10968.
7. Lamber R., Wetjen S., Schulz-Ekloff G., Baalmann A. J. Phys. Chem. 1995, 99:13834.
8. Lord M.S., Foss M., Besenbacher F. Nano Today 2010, 5:66.
9. Sun T.L., Feng L., Gao X.F., Jiang L. Acc. Chem. Res. 2005, 644.
10. Hawkeye M.M., Brett M.J. J. Vac. Sci. Technol. A 2007, 25:1317.
11. Harding G.L., Craig S. J. Vac. Sci. Technol. 1979, 16:857.
12. Beale H.A. Ind. Res. Dev. 1981, 23:135.
13. Kay E. Phys. D At. Mol. Clusters 1986, 3:251.
14. Martinů L., Biederman H. Vacuum 1986, 36:477.
15. Biederman H., Osada Y. Plasma Polymerisation Processes 1992, Elsevier, Amsterdam.
16. Schürmann U., Hartung W., Takele H., Zaporojtchenko V., Faupel F. Nanotechnology 2005, 16:1078.
17. Faupel F., Zaporojtchenko V., Greve H., Schürmann U., Chakravadhanula V.S.K., Hanisch Ch., Kulkarni A., Gerber A., Quandt E., Podschun R. Contrib. Plasma Phys. 2007, 47:537.
18. Martinů L., Biederman H. Vacuum 1986, 36:477.
19. Hanus J., Drabik M., Hlidek P., Biederman H., Radnoczi G., Slavinska D. Vacuum 2008, 83(2):454.
20. Kay E., Laurent C., Parkin S.S.P., Mauri D. Mater. Res. Soc. Symp. 1990, 195.
21. Greve H., Pochstein C., Takele H., Zaporojtchenko V., Gerber A., Frommberger M., Quandt E., Faupel F. Appl. Phys. Lett. 2006, 89:242501. (3p).
22. Körner E., Aguirre M.H., Fortunato G., Ritter A., Ruhe J., Hegemann D. Plasma Process. Polym. 2010, 7:619.
23. Biederman H. Surf. Coat. Technol. 2011, 205:S10.
24. Dilonardo E., Milella A., Palumbo F., Capitani G., d'Agostino R., Fracassi F. Plasma Process. Polym. 2010, 7:51.
25. Klaus C.P., Memming R. Mater. Sci. Forum 1989, 52(53):106.
26. Biederman H., Howson R.P., Slavinska D., Stundzia V., Zemek J. Vacuum 1997, 48:883.
27. Banks A., Rutledge S.K., Dever J.A., Hambourger P.D., Walters P., Bruckner E.J. 39th Annual Technical Conference SVC 1996, 83:431.
28. Hozumi A., Sekoguchi H., Kakinoki N., Takai O. J. Mater. Sci. 1997, 32:4253.
29. Hozumi A., Takai O. Thin Solid Films 1997, 303:222.
30. Choukourov A., Pihosh Y., Stelmashuk V., Biederman H., Slavinska D., Kormunda M., Zajickova L. Surf. Coat. Technol. 2002, 151-152:214.
31. Pihosh Y., Biederman H., Slavinska D., Kousal J., Choukourov A., Trchova M., Mackova A., Boldyreva A. Vacuum 2006, 81:38.
32. Stelmashuk V., Biederman H., Slavinska D., Zemek J., Trchova M. Vacuum 2005, 77:131.
33. Michler T., Grischke M., Bewilologua K., Hieke A. Surf. Coat. Technol. 1999, 11:41.
34. Franclova J., Kucerova V., Bursikova V., Zajickova L., Perina V. Czech. J. Phys. 2004, 54:847.
35. Pihosh Y., Biederman H., Slavinska D., Kousal J., Choukourov A., Trchova M., Mackova A., Boldyreva A. Vacuum 2006, 81:32.
36. Drabik M., Kousal J., Pihosh Y., Choukourov A., Biederman H., Slavinska D., Mackova A., Boldyreva A., Pesicka J. Vacuum 2007, 81:920.
37. Fujishima A., Rao T.N., Tryk D.A. J. Photochem. Photobiol. C 2000, 1:1.
38. Linkous C.A. Environ. Sci. Technol. 2000, 34:44754.
39. Hoppe H., Sariciftci N.S. J. Mater. Res. 2004, 19:1924.
40. Hagfeldt A., Didriksson B. Sol. Energy Mater. Sol. Cells 1994, 31:481.
41. Hayakawa I., Iwamoto Y., Kikuta K. Sens. Actuators, B 2000, 62:55.
42. Loebl P., Huppertz M., Mergel D. Thin Solid Films 1994, 251:72.
43. Mardare D., Tasca M., Delibas M., Rusu G.I. Appl. Surf. Sci. 2000, 156:200.
44. Zheng S.K., Wang T.M., Ziang G., Wang C. Vacuum 2001, 62:361.
45. Miao L., Jin P., Kaneko K., Terai A., Nabatova-Gabain N., Tanemura S. Appl. Surf. Sci. 2003, 212:255.
46. Drabik M., Hanus J., Kousal J., Choukourov A., Biederman H., Slavinska D., Mackova A., Pesicka J. Plasma Process. Polym. 2007, 4:654.
47. Kiema G.K., Colgan M.J., Brett M.J. Sol. Energy Mater. Sol. Cells 2005, 85:321.
48. Shirtcliffe N.J., McHale G., Atherton S., Newton M.I. Adv. Colloid Interface Sci. 2010, 161:124.
49. Gao S., Li Z., Jia X., Jiang K. J. Phys. Chem. C 2010, 114:19239.
50. Ruiz A., Valsesia A., Ceccone G., Gilliland D., Colpo P., Rossi F. Langmuir 2007, 23:12984.
51. Tsougeni K., Vourdas N., Cardinaud C., Tserepi A., Gogolides E. Langmuir 2009, 25:11748.
52. Milella A., Palumbo F., Favia P., Cicala G., d'Agostino R. Pure Appl. Chem. 2005, 77:399.
53. Intranuovo F., Sardella E., Rossini P., d'Agostino R., Favia P. Chem. Vap. Deposition 2009, 15:95.
54. Cicala G., Milella A., Palumbo F., Favia P., d'Agostino R. Diamond Relat. Mater. 2003, 12:2020.
55. Milella A., Di Mundo R., Palumbo F., Favia P., Fracassi F., d'Agostino R. Plasma Process. Polym. 2009, 6:460.
56. Drabik M., Polonskyi O., Kylian O., Cechvala J., Artemenko A., Gordeev I., Choukourov A., Slavinska D., Matolinova I., Biederman H. Plasma Process. Polym. 2010, 7:544.
57. Kylián O., Drábik M., Polonskyi O., Čechvala J., Artemenko A., Gordeev I., Choukourov A., Matolínová I., Slavínská D., Biederman H. Thin Solid Films 2011, 519:6426.
58. Kundt A. Ann. Phys. 1886, 27:59.
59. Steele J.J., Brett M.J. J. Mater. Sci. Mater. Electron. 2007, 18:367.
60. Steele J.J., van Popta A.C., Hawkeye M.M., Sit J.C., Brett M.J. Sens. Actuators, B 2006, 120:213.
61. Jen Y.-J., Lin M.-J., Chao J.-H. Sens. Actuators, B 2010, 149:67.
62. Bonakdarpour A., Fleischauer M.D., Brett M.J., Dahn J.R. Appl. Catal. A: Gen. 2008, 349:110.
63. Choukourov A., Solar P., Polonskyi O., Hanus J., Drabik M., Kylian O., Pavlova E., Slavinska D., Biederman H. Plasma Process. Polym. 2010, 7:25.
64. Sattler K., Muehlbach J., Recknagel E. Phys. Rev. Lett. 1980, 45:821.
65. Haberland H., Mall M., Mosseler M., Qiang Y., Rainers T., Turner Y. J. Vac. Sci. Technol. A 1994, 12:2925.
66. Bhattacharyya S.R., Datta D., Chini T.K., Ghose D., Shyjumon I., Hippler R. Nucl. Instrum. Methods Phys. Res. B 2009, 267:1432.
67. Marek A., Valter J., Kadlec S., Vyskočil J. Surf. Coat. Technol. 2011, 205:S573.
68. Maicas M., Sanz M., Cui H., Aroca C., Sanchez P. J. Magn. Magn. Mater. 2010, 322:3485.
69. Ayesh A.I., Thaker S., Qamhieh N., Ghamlouche H. J. Nanopart. Res. 2011, 13:1125.
70. Binns C. Surf. Sci. Rep. 2001, 44:1.
71. Wegner K., Piseri P., Vahedi Tafreshi H., Milani P. J. Phys. D: Appl. Phys. 2006, 39:R439.
72. Solař P., Polonskyi O., Choukourov A., Artemenko A., Hanuš J., Biederman H., Slavínská D. Surf. Coat. Technol. 2011, 205:S42.
73. Polonskyi O., Solař P., Kylián O., Drábik M., Artemenko A., Kousal J., Hanuš J., Pešička J., Matolínová I., Kolíbalová E., Slavínská D., Biederman H. Thin Solid Films 2011, 10.1016/j.tsf.2011.04.100.