Nanopatterning of plasma polymer thin films by arf photolithography: Impact of polymer structure on patterning properties

Plasma Processes and Polymers

Volumn 7, Issue 7, 2010, Pages 571-581

  Dirani, Ali ^a   Wieder, Fernand ^a   Roucoules, Vincent ^a   Airoudj, Aissam ^a   Soppera, Olivier ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Cohesion; Diffusion; Laser irradiation; Nanostructures; Photopatterning; Plasma polymerization

Indexed keywords

AMINOLYSIS REACTION; ARF EXCIMER LASER; COVALENT ATTACHMENT; DEEP-UV; DUTY CYCLES; EXPOSURE-TIME; FUNCTIONALIZED; LASER IRRADIATIONS; MICRO-SCALES; NANOPATTERNING; PERIODICAL STRUCTURE; PHOTO PATTERNING; PHOTO-INDUCED; PLASMA POLYMERS; POLYMER STRUCTURE; POLYMER SURFACES; PULSED PLASMA DEPOSITION; REACTIVE GROUP; SIMPLE METHOD;

ADHESION; CHEMICAL VAPOR DEPOSITION; EXCIMER LASERS; GAS LASERS; IRRADIATION; NANOSTRUCTURES; ORGANIC COMPOUNDS; PHOTOLITHOGRAPHY; PLASMA DEPOSITION; PLASMAS; POLYMER FILMS; POLYMERIC FILMS; POLYMERS;

PLASMA POLYMERIZATION;

EID: 77954897187     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200900162     Document Type: Article

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