Gas aggregation nanocluster source - Reactive sputter deposition of copper and titanium nanoclusters

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Marek, Aleš ^a   Valter, Jan ^a   Kadlec, Stanislav ^a   Vyskočil, Jiří ^a  

^a HVM Plasma Ltd   (Czech Republic)

Author keywords

Cluster formation; Gas aggregation; Nanocluster; Reactive sputtering

Indexed keywords

CLUSTER FORMATIONS; GAS AGGREGATION; INFLUENCE OF OXYGEN; QUADRUPOLE MASS FILTERS; QUARTZ CRYSTAL; REACTIVE SPUTTER DEPOSITION;

ARGON; MAGNETRONS; OXYGEN; QUARTZ; TITANIUM;

NANOCLUSTERS;

EID: 79959784355     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.12.027     Document Type: Article

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