Production and deposition of energetic metal nanocluster ions of silver on Si substrates

Surface and Coatings Technology

Volumn 203, Issue 17-18, 2009, Pages 2452-2457

  Datta, D ^a   Bhattacharyya, S R ^a   Shyjumon, I ^b   Ghose, D ^a   Hippler, R ^b  

^a SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

^b UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Cluster diffusion; Cluster flattening; Ion implantation; Metal nanocluster; Morphology; Rapid Thermal Annealing (RTA); Scanning electron microscopy; Supported clusters

Indexed keywords

AFM; ARGON-IONS; ATOMIC-FORCE MICROSCOPIES; CLUSTER DIFFUSION; CLUSTER FLATTENING; ENERGY DISPERSIVE X-RAY ANALYSIS; HEIGHT DISTRIBUTIONS; ION IRRADIATIONS; MAGNETRON DISCHARGES; METAL NANOCLUSTER; NANOCLUSTER FILMS; SEM; SEM/EDX; SI SUBSTRATES; SILVER NANOCLUSTERS; STRUCTURAL INFORMATIONS; SUPPORTED CLUSTERS; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

ARGON; ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPES; ELECTRON TUBES; ELECTRONS; ION BOMBARDMENT; ION IMPLANTATION; LIQUID NITROGEN; METAL ANALYSIS; MORPHOLOGY; NANOCLUSTERS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; SCANNING; SCANNING ELECTRON MICROSCOPY; SILVER; SUBSTRATES; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349242259     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.02.114     Document Type: Article

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