-
1
-
-
78649557217
-
-
10.1002/ppa201000038
-
V. Kumar, J. Pulpytel, H. Rauscher, I. Mannelli, F. Rossi, and F. Arefi-Khonsari, Plasma Processes Polym. 7, 926 (2010). 10.1002/ppap.201000038
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 926
-
-
Kumar, V.1
Pulpytel, J.2
Rauscher, H.3
Mannelli, I.4
Rossi, F.5
Arefi-Khonsari, F.6
-
2
-
-
80052089079
-
-
10.1002/anie.201102545
-
F. L. Geyer, E. Ueda, U. Liebel, N. Grau, and A. Levkin, Angew. Chem. Int. Ed. 50, 8424 (2011). 10.1002/anie.201102545
-
(2011)
Angew. Chem. Int. Ed.
, vol.50
, pp. 8424
-
-
Geyer, F.L.1
Ueda, E.2
Liebel, U.3
Grau, N.4
Levkin, A.5
-
3
-
-
36248997699
-
-
10.1002/adma.200700934
-
S. Wang and L. Jiang, Adv. Mater. 19, 3423 (2007). 10.1002/adma.200700934
-
(2007)
Adv. Mater.
, vol.19
, pp. 3423
-
-
Wang, S.1
Jiang, L.2
-
5
-
-
0034204897
-
-
10.1021/la991660o
-
M. Miwa, A. Nakajima, A. Fujishima, K. Hashimoto, and T. Watanabe, Langmuir 16, 5754-5760 (2000). 10.1021/la991660o
-
(2000)
Langmuir
, vol.16
, pp. 5754-5760
-
-
Miwa, M.1
Nakajima, A.2
Fujishima, A.3
Hashimoto, K.4
Watanabe, T.5
-
7
-
-
36348949681
-
-
10.1021/la7025413
-
S. Boduroglu, M. Cetinkaya, W. J. Dressick, A. Singh, and M. C. Demirel, Langmuir 23, 11391 (2007). 10.1021/la7025413
-
(2007)
Langmuir
, vol.23
, pp. 11391
-
-
Boduroglu, S.1
Cetinkaya, M.2
Dressick, W.J.3
Singh, A.4
Demirel, M.C.5
-
9
-
-
80055006670
-
-
10.1039/c1sm05849e
-
J. Drelich, E. Chibowski, D. Desheng Meng, and K. Terpilowski, Soft Matter 7, 9804 (2011). 10.1039/c1sm05849e
-
(2011)
Soft Matter
, vol.7
, pp. 9804
-
-
Drelich, J.1
Chibowski, E.2
Desheng Meng, D.3
Terpilowski, K.4
-
10
-
-
4243097369
-
-
10.1021/la950418o
-
T. Onda, S. Shibuichi, N. Satoh, and K. Tsujii, Langmuir 12, 2125 (1996). 10.1021/la950418o
-
(1996)
Langmuir
, vol.12
, pp. 2125
-
-
Onda, T.1
Shibuichi, S.2
Satoh, N.3
Tsujii, K.4
-
11
-
-
0141839319
-
-
10.1021/jp9616728
-
S. Shibuichi, T. Onda, N. Satoh, and K. Tsujii, J. Phys. Chem. 100, 19512 (1996). 10.1021/jp9616728
-
(1996)
J. Phys. Chem.
, vol.100
, pp. 19512
-
-
Shibuichi, S.1
Onda, T.2
Satoh, N.3
Tsujii, K.4
-
12
-
-
0030854750
-
-
10.1038/41233
-
R. Wang, K. Hashimoto, A. Fujishima, M. Chikuni, E. Kojima, A. Kitamura, M. Shimohigoshi, and T. Watanabe, Nature 388, 431 (1997). 10.1038/41233
-
(1997)
Nature
, vol.388
, pp. 431
-
-
Wang, R.1
Hashimoto, K.2
Fujishima, A.3
Chikuni, M.4
Kojima, E.5
Kitamura, A.6
Shimohigoshi, M.7
Watanabe, T.8
-
13
-
-
84865522633
-
-
10.1021/am101052z
-
S. H. Lee, Z. R. Dilworth, E. Hsiao, A. L. Barnette, M. Marino, J. H. Kim, J. Kang, T. Jung, and S. H. Kim, ACS Appl. Mater. Interfaces 3, 476 (2011). 10.1021/am101052z
-
(2011)
ACS Appl. Mater. Interfaces
, vol.3
, pp. 476
-
-
Lee, S.H.1
Dilworth, Z.R.2
Hsiao, E.3
Barnette, A.L.4
Marino, M.5
Kim J, H.6
Kang, J.7
Jung, T.8
Kim, S.H.9
-
15
-
-
77954916024
-
-
10.1002/ppa200900164
-
M. Drábik, O. Polonskyi, O. Kylián, J. Čechvala, A. Artemenko, I. Gordeev, A. Choukourov, D. Slavínská, I. Matolínová, and H. Biederman, Plasma Processes Polym. 7, 544 (2010). 10.1002/ppap.200900164
-
(2010)
Plasma Processes Polym.
, vol.7
, pp. 544
-
-
Drábik, M.1
Polonskyi, O.2
Kylián, O.3
Čechvala, J.4
Artemenko, A.5
Gordeev, I.6
Choukourov, A.7
Slavínská, D.8
Matolínová, I.9
Biederman, H.10
-
16
-
-
33947181501
-
-
10.1021/la0616303
-
A. W. Hassel, S. Milenkovic, U. Schurmann, H. Greve, V. Zaporojtchenko, R. Adelung, and F. Faupel, Langmuir 23, 2091 (2007). 10.1021/la0616303
-
(2007)
Langmuir
, vol.23
, pp. 2091
-
-
Hassel, A.W.1
Milenkovic, S.2
Schurmann, U.3
Greve, H.4
Zaporojtchenko, V.5
Adelung, R.6
Faupel, F.7
-
17
-
-
84859842873
-
-
10.1002/ppa201100153
-
S. Vizireanu, M. D. Ionita, G. Dinescu, I. Enculescu, M. Baibarac, and I. Baltog, Plasma Processes Polym. 9, 363 (2012). 10.1002/ppap.201100153
-
(2012)
Plasma Processes Polym.
, vol.9
, pp. 363
-
-
Vizireanu, S.1
Ionita, M.D.2
Dinescu, G.3
Enculescu, I.4
Baibarac, M.5
Baltog, I.6
-
18
-
-
84856871095
-
-
10.1002/ppa201100113
-
O. Kylián, O. Polonskyi, J. Kratochvíl, A. Artemenko, A. Choukourov, M. Drábik, P. Solař, D. Slavínská, and H. Biederman, Plasma Processes Polym. 9, 180 (2012). 10.1002/ppap.201100113
-
(2012)
Plasma Processes Polym.
, vol.9
, pp. 180
-
-
Kylián, O.1
Polonskyi, O.2
Kratochvíl, J.3
Artemenko, A.4
Choukourov, A.5
Drábik, M.6
Solař, P.7
Slavínská, D.8
Biederman, H.9
-
20
-
-
79651473092
-
-
10.1007/s00339-010-6139-5
-
V. Zaporojtchenko, C. Pakula, S. W. Basuki, Th. Strunskus, D. Zargarani, R. Herges, and F. Faupel, Appl. Phys. A 102, 421 (2011). 10.1007/s00339-010- 6139-5
-
(2011)
Appl. Phys. A
, vol.102
, pp. 421
-
-
Zaporojtchenko, V.1
Pakula, C.2
Basuki, S.W.3
Strunskus, Th.4
Zargarani, D.5
Herges, R.6
Faupel, F.7
-
21
-
-
75749137001
-
-
10.1039/b913622c
-
B. Xin and J. Hao, Chem. Soc. Rev. 39, 769 (2010). 10.1039/b913622c
-
(2010)
Chem. Soc. Rev.
, vol.39
, pp. 769
-
-
Xin, B.1
Hao, J.2
-
22
-
-
84864141295
-
-
10.1063/1.4731751
-
E. Kovacevic, J. Berndt, Th. Strunskus, and L. Boufendi, J. Appl. Phys. 112, 013303 (2012). 10.1063/1.4731751
-
(2012)
J. Appl. Phys.
, vol.112
, pp. 013303
-
-
Kovacevic, E.1
Berndt, J.2
Strunskus, Th.3
Boufendi, L.4
-
23
-
-
0036643612
-
-
10.1016/S0167-9317(02)00572-5
-
S. R. Mohanty, C. Cachoncinlle, C. Fleurier, E. Robert, J.-M. Pouvesle, R. Viladrosa, and R. Dussart, Microelectron. Eng. 61-62, 179 (2002). 10.1016/S0167-9317(02)00572-5
-
(2002)
Microelectron. Eng.
, vol.61-62
, pp. 179
-
-
Mohanty, S.R.1
Cachoncinlle, C.2
Fleurier, C.3
Robert, E.4
Pouvesle, J.-M.5
Viladrosa, R.6
Dussart, R.7
-
24
-
-
0036893146
-
-
10.1016/S0167-9317(02)00728-1
-
S. R. Mohanty, E. Robert, R. Dussart, R. Viladrosa, J.-M. Pouvesle, C. Fleurier, and C. Cachoncinlle, Microelectron. Eng. 65, 47 (2003). 10.1016/S0167-9317(02)00728-1
-
(2003)
Microelectron. Eng.
, vol.65
, pp. 47
-
-
Mohanty, S.R.1
Robert, E.2
Dussart, R.3
Viladrosa, R.4
Pouvesle, J.-M.5
Fleurier, C.6
Cachoncinlle, C.7
-
25
-
-
0345015541
-
-
10.1088/0963-0252/12/4/319
-
J. M. Pouvesle, E. Robert, T. Gonthiez, R. Viladrosa, J. Pons, O. Sarroukh, M. Idrissi, B. Metay, S. R. Mohanty, C. Fleurier, and C. Cachoncinlle, Plasma Sources Sci. Technol. 12, S43 (2003). 10.1088/0963-0252/12/4/319
-
(2003)
Plasma Sources Sci. Technol.
, vol.12
, pp. 43
-
-
Pouvesle, J.M.1
Robert, E.2
Gonthiez, T.3
Viladrosa, R.4
Pons, J.5
Sarroukh, O.6
Idrissi, M.7
Metay, B.8
Mohanty, S.R.9
Fleurier, C.10
Cachoncinlle, C.11
-
27
-
-
0000555519
-
-
10.1007/s002160050352
-
W. E. S. Unger, A. Lippitz, Ch. Wöll, and W. Heckmann, Fresenius J. Anal. Chem. 358, 89 (1997). 10.1007/s002160050352
-
(1997)
Fresenius J. Anal. Chem.
, vol.358
, pp. 89
-
-
Unger, W.E.S.1
Lippitz, A.2
Wöll, Ch.3
Heckmann, W.4
-
28
-
-
66549129832
-
-
10.1063/1.3129318
-
E. Kovacevic, J. Berndt, I. Stefanovic, H. W. Becker, C. Godde, Th. Strunskus, and L. Boufendi, J. Appl. Phys. 105, 104910 (2009). 10.1063/1.3129318
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 104910
-
-
Kovacevic, E.1
Berndt, J.2
Stefanovic, I.3
Becker, H.W.4
Godde, C.5
Strunskus, Th.6
Boufendi, L.7
-
29
-
-
84863711519
-
-
10.1039/c2cp23748b
-
W. Zhang, A. Nefedov, M. Naboka, L. Caob, and Ch. Woell, Phys. Chem. Chem. Phys. 14, 10125 (2012). 10.1039/c2cp23748b
-
(2012)
Phys. Chem. Chem. Phys.
, vol.14
, pp. 10125
-
-
Zhang, W.1
Nefedov, A.2
Naboka, M.3
Caob, L.4
Woell, Ch.5
-
30
-
-
69849083579
-
-
10.1002/ctp200910016
-
J. Berndt, E. Kovacevic, I. Stefanovic, J. Winter, and L. Boufendi, Contrib. Plasma Phys. 49, 107 (2009). 10.1002/ctpp.200910016
-
(2009)
Contrib. Plasma Phys.
, vol.49
, pp. 107
-
-
Berndt, J.1
Kovacevic, E.2
Stefanovic, I.3
Winter, J.4
Boufendi, L.5
-
31
-
-
70349634926
-
-
10.1063/1.3224874
-
J. Berndt, E. Kovacevic, I. Stefanovic, and L. Boufendi, J. Appl. Phys. 106, 063309 (2009). 10.1063/1.3224874
-
(2009)
J. Appl. Phys.
, vol.106
, pp. 063309
-
-
Berndt, J.1
Kovacevic, E.2
Stefanovic, I.3
Boufendi, L.4
-
32
-
-
74949103356
-
-
10.1088/0022-3727/43/4/043001
-
J. Benedikt, J. Phys. D: Appl. Phys. 43, 043001 (2010). 10.1088/0022-3727/43/4/043001
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, pp. 043001
-
-
Benedikt, J.1
-
33
-
-
77953310993
-
-
10.1351/PAC-CON-09-10-30
-
M. Mikikian, M. Cavarroc, L. Couëdel, Y. Tessier, and L. Boufendi, Pure Appl. Chem. 82, 1273 (2010). 10.1351/PAC-CON-09-10-30
-
(2010)
Pure Appl. Chem.
, vol.82
, pp. 1273
-
-
Mikikian, M.1
Cavarroc, M.2
Couëdel, L.3
Tessier, Y.4
Boufendi, L.5
-
35
-
-
77953877071
-
-
10.1088/0022-3727/43/27/272001
-
T.-Y. Chung, D. Nest, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, D. Wang, M. Li, and E. A. Hudson, J. Phys. D: Appl. Phys. 43, 272001 (2010). 10.1088/0022-3727/43/27/272001
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, pp. 272001
-
-
Chung, T.-Y.1
Nest, D.2
Graves, D.B.3
Weilnboeck, F.4
Bruce, R.L.5
Oehrlein, G.S.6
Wang, D.7
Li, M.8
Hudson, E.A.9
-
36
-
-
24344463929
-
-
10.1002/ppa200500022
-
S. Swaraj, U. Oran, A. Lippitz, J. F. Friedrich, and W. E. S. Unger, Plasma Processes Polym. 2, 572 (2005). 10.1002/ppap.200500022
-
(2005)
Plasma Processes Polym.
, vol.2
, pp. 572
-
-
Swaraj, S.1
Oran, U.2
Lippitz, A.3
Friedrich, J.F.4
Unger, W.E.S.5
-
37
-
-
0035545793
-
-
10.1016/S0368-2048(01)00330-9
-
I. Retzko, J. F. Friedrich, A. Lippitz, and W. E. S. Unger, J. Electron Spectrosc. Relat. Phenom. 121, 111 (2001). 10.1016/S0368-2048(01)00330-9
-
(2001)
J. Electron Spectrosc. Relat. Phenom.
, vol.121
, pp. 111
-
-
Retzko, I.1
Friedrich, J.F.2
Lippitz, A.3
Unger, W.E.S.4
-
39
-
-
49349086580
-
-
10.1016/j.tsf.2008.02.033
-
F. Truica-Marasescu, P. L. Girard-Lauriault, A. Lippitz, W. E. S. Unger, and M. R. Wertheimer, Thin Solid Films 516, 7406 (2008). 10.1016/j.tsf.2008.02. 033
-
(2008)
Thin Solid Films
, vol.516
, pp. 7406
-
-
Truica-Marasescu, F.1
Girard-Lauriault, P.L.2
Lippitz, A.3
Unger, W.E.S.4
Wertheimer, M.R.5
-
40
-
-
4344601301
-
-
10.1021/jp048250f
-
A. G. Shard, J. D. Whittle, A. J. Beck, P. N. Brookes, N. A. Bullett, R. A. Talib, A. Mistry, D. Barton, and S. L. McArthur, J. Phys. Chem. B 108, 12472 (2004). 10.1021/jp048250f
-
(2004)
J. Phys. Chem. B
, vol.108
, pp. 12472
-
-
Shard, A.G.1
Whittle, J.D.2
Beck, A.J.3
Brookes, P.N.4
Bullett, N.A.5
Talib, R.A.6
Mistry, A.7
Barton, D.8
McArthur, S.L.9
-
43
-
-
0037818304
-
-
10.1163/156855403765826865
-
J. Friedrich, W. Unger, A. Lippitz, I. Koprinarov, A. Ghode, S. H. Geng, and G. Kühn, Compos. Interfaces 10, 139 (2003). 10.1163/156855403765826865
-
(2003)
Compos. Interfaces
, vol.10
, pp. 139
-
-
Friedrich, J.1
Unger, W.2
Lippitz, A.3
Koprinarov, I.4
Ghode, A.5
Geng, S.H.6
Kühn, G.7
|