Coating of transparent water-repellent thin films by plasma-enhanced CVD

Journal of Non-Crystalline Solids

Volumn 218, Issue , 1997, Pages 280-285

  Takai, Osamu ^a   Hozumi, Atsushi ^a   Sugimoto, Nobuhisa ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; FILM PREPARATION; FLUORINE COMPOUNDS; PLASMA APPLICATIONS; SILANES; SILICA; THIN FILMS; TRANSPARENCY;

FLUOROALKYL SILANES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); TRIMETHYLMETOXYSILANES;

WATERPROOF COATINGS;

EID: 0031549324     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00168-3     Document Type: Article

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