Surface morphology in the early stages of plasma polymer film growth from amine-containing monomers

Plasma Processes and Polymers

Volumn 8, Issue 5, 2011, Pages 367-372

  Michelmore, Andrew ^a   Martinek, Petr ^a   Sah, Vasu ^a   Short, Robert D ^a   Vasilev, Krasimir ^a  

^a UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

Author keywords

allylamine; n heptylamine; plasma polymerisation; surface morphology; thin films

Indexed keywords

AFM; ALLYL AMINE; CLOSE PROXIMITY; N-HEPTYLAMINE; PLASMA POLYMER FILMS; PLASMA POLYMERISATION; PLASMA POLYMERS; POST-PLASMA; SILICON SURFACES; XPS DATA;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; FILM GROWTH; MORPHOLOGY; ORGANIC COMPOUNDS; PHOTOELECTRON SPECTROSCOPY; PLASMA DEPOSITION; PLASMAS; POLYMER FILMS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE MORPHOLOGY;

EID: 79956012406     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000140     Document Type: Article

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