Deposition of well-defined fluoropolymer nanospheres on PET substrate by plasma polymerization of heptadecafluorodecyl acrylate and their potential application as a protective layer

Plasma Processes and Polymers

Volumn 2, Issue 2, 2005, Pages 127-135

  Feng, Jia Chun ^a   Huang, Wei ^a   Fu, Guo Dong ^b   Kang, En Tang ^b   Neoh, Koon Gee ^b  

^a FUDAN UNIVERSITY   (China)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Fluoropolymers; Nanospheres; Plasma polymerization; Protection

Indexed keywords

ACRYLIC MONOMERS; ATOMIC FORCE MICROSCOPY; DEPOSITION; FLUORINE CONTAINING POLYMERS; MORPHOLOGY; PLASMA POLYMERIZATION; PLASTIC FILMS; POLYETHYLENE TEREPHTHALATES; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SURFACE REACTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HEPTADECAFLUORODECYL ACRYLATE; PROTECTIVE LAYER; REACTIVE SPECIES; WELL-DEFINED FLUOROPOLYMER NANOSPHERES;

NANOSTRUCTURED MATERIALS;

EID: 23044513907     PISSN: 16128850     EISSN: None     Source Type: Journal    
DOI: 10.1002/ppap.200400030     Document Type: Article

References (50)

1. G. Maier, Prog. Polym. Sci. 2001, 26, 3.
2. "Handbook of Low and High Dielectric Constant Materials and Their Application: Materials and Processing", H. S. Nalwa, Ed., Academic Press, San Diego, CA 1999, p. 4.
3. S. J. Martin, J. P. Godschalx, M. E. Mills, E. O. Shaffer, II, P. H. Townsend, Adv. Mater. 2000, 12, 1769.
4. M. R. Bakanov, S. Vanhaelemeersch, H. Bender, K. Maex, J. Vac. Sci. Technol. B 1999, 17, 372.
5. M. Pfeiffer, S. R. Forrest, K. Leo, M. E. Thompson, Adv. Mater. 2002, 14, 1633.
6. C. D. Muller, A. Falcou, N. Reckefuss, M. Rojahn, V. Wiederhirn, P. Rudati, H. Frohne, O. Nuyken, H. Becker, K. Meerholz, Nature 2003, 421, 829.
7. J. H. Schon, C. Kloc, E. Bucher, B. Batiogg, Nature 2000, 403, 408.
8. F. Ghebremichael, Appl. Phys. Lett. 2002, 81, 2971.
9. G. Meinhardt, D. Gruber, G. Jakopic, Y. Geerts, W. Papousek, G. Leising, Synth. Met. 2001, 121, 1593.
10. Y. Yang, A. J. Heeger, Nature 1994, 372, 344.
11. M. Pauchard, J. Swensen, D. Moses, A. J. Heeger, E. Perzon, M. R. Andersson, J. Appl. Phys. 2003, 94, 3543.
12. C. Waldauf, P. Schilinsky, M. Perisutti, J. Hauch, C. J. Brabec, Adv. Mater. 2003, 15, 2084.
13. E. Sacher, Prog. Surf. Sci. 1994, 47, 273.
14. K. Endo, K. Shinoda, T. Tatsumi, J. Appl. Phys. 1999, 86, 2739.
15. I. T. Martin, G. S. Malkov, C. I. Butoi, E. R. Fisher, J. Vac. Sci. Technol. A. 2004, 22, 227.
16. C. I. Butoi, N. M. Mackie, L. J. Gamble, D. G. Castner, J. Barnd, A. M. Miller, E. R. Fisher, Chem. Mater. 2000, 12, 2014.
17. A. Sankaran, M. J. Kushner, Appl. Phys. Lett. 2003, 82, 1824.
18. S. J. Limb, D. J. Edell, E. F. Gleason, K. K. Gleason, J. Appl. Polym. Sci. 1998, 67, 1489.
19. J. E. Chase, F. J. Boerio, J. Vac. Sci. Technol. A 2003, 21, 607.
20. P. B. Leezenberg, T. C. Reiley, G. W. Tyndall, J. Vac. Sci. Technol. 1999, 17, 275.
21. S. F. Durrant, S. G. C. Castro, L. E. Bolvar-Marinez, D. S. Galvao, M. A. B. de Moraes, Thin Solid Films 1997, 304, 149.
22. T. Masuoka, T. Iwatsubo, K. Mizoguchi, J. Appl. Polym. Sci. 1992, 46, 311.
23. W. Chen, A. Y. Fadeev, M. C. Hsieh, D. Oner, J. Youngblood, T. J. McCarthy, Langmuir 1999, 15, 3395.
24. L. Sandrin, M. S. Silverstein, E. Sacher, Polymer 2001, 42, 3761.
25. G. Q. Yu, B. K. Tay, Z. Sun, L. K. Pan, Appl. Surf. Sci. 2003, 219, 228.
26. G. D. Fu, E. T. Kang, K. G. Neoh, J. Phys. Chem. B 2003, 107, 13903.
27. D. O. H. Teare, C. G. Spanos, P. Ridley, E. J. Kinmond, V. Roucoules, J. P. S. Badyal, Chem. Mater. 2002, 14, 4566.
28. S. R. Coulson, I. S. Woodward, J. P. S. Badyal, S. A. Brewer, C. Willis, Chem. Mater. 2000, 12, 2031.
29. A. V. Kabashin, M. Meunier, Appl. Phys. Lett. 2003, 82, 1619.
30. A. V. Kabashin, M. Meunier, Mater. Sci. Eng. B 2003, 101, 60.
31. Y. Leterrier, Prog. Mater. Sci. 2003, 48, 1.
32. K. L. Choy, Prog. Mater. Sci. 2003, 48, 57.
33. I. Prosycevas, S. Tamulevicius, A. Guobiene, G. Niaura, J. Puiso, Solid State Phenom. 2003, 94, 265.
34. L. Boufendi, A. Plain, J. P. Blondeau, A. Bouchoule, C. Laure, M. Toogood, Appl. Phys. Lett. 1992, 60, 169.
35. G. Cicala, A. Milella, E. Palumbo, P. Rossini, P. Favia, R. d'Agostino, Macromolecules 2002, 35, 8920.
36. G. Cicala, A. Milella, E. Palumbo, P. Favia, R. d'Agostino, Diamond Relat. Mater. 2003, 12, 2020.
37. Y. Zhang, E. T. Kang, K. G. Neoh, W. Huang, A. C. H. Huan, H. Zhang, R. N. Lamb, Polymer 2002, 43, 7279.
38. C. Bichler T. Kerbstadt, H. C. Langowski, U. Moosheimer, Surf. Coat. Technol. 1997, 97, 299.
39. C. Hollenstein, Plasma Phys. Control Fusion 2000, 42, R93.
40. J. Berndt, H. Hong, E. Kovacevic, I. Stefanovic, J. Winter, Vacuum 2003, 71, 377.
41. A. Hadjadj, A. Beorchia, P. R. I. Cabarrocas, L. Boufendi, S. Huet, J. L. Bunbendorff, J. Phys. D: Appl. Phys. 2001, 34, 690.
42. J. F. Moulder, W. F. Stickle, P. E. Spbol, K. D. Bomben, in: "X-Ray Photoelectron Spectroscopy", J. Chastian, Ed., Perkin-Elmer, Eden Prairie, MN 1992, p. 41.
43. B. Ameduri, R. Bongiovanni, V. Lombardi, A. Pollicino, A. Priola, A. Recca, J. Polym. Sci., Part A: Polym. Chem. 2001, 39, 4227.
44. CRC Handbook of Chemistry and Physics, 63rd ed., R. C. Weast, M. J. Astle, Eds., CRC Press Inc., Boca Raton, Florida 1982, F185.
45. M. Miwa, A. Nakajima, A. Fujishima, K. Hashimoto, T. Watanabe, Langmuir 2000, 16, 5754.
46. S. M. M. Ramos, E. Charlaix, A. Benyagoub, Surf. Sci. 2003, 540, 355.
47. S. M. M. Ramos, E. Charlaix, A. Benyagoub, M. Toulemonde, Phys. Rev. E 2003, 67, 031604.
48. S. Al-Abdul, S. Razzak, A. Jabarin, Polym. Int. 2002, 5, 164.
49. T. Barany, J. Karger-Kocsis, T. Czigany, Polym. Degrad. Stab. 2003, 82, 271.
50. E. Chibowski, A. Ontiveros-Ortega, R. Perea-Carpio, J. Adhes. Sci. Technol. 2002, 16, 1367.