Fluorocarbon coatings via plasma enhanced chemical vapor deposition of 1H,1H,2H,2H-perfluorodecyl acrylate-1, spectroscopic characterization by FT-IR and XPS

Plasma Processes and Polymers

Volumn 7, Issue 11, 2010, Pages 939-950

  Kumar, Virendra ^a,b   Pulpytel, Jerome ^a   Arefi Khonsari, Farzaneh ^a  

^a SORBONNE UNIVERSITÉ   (France)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

fluorocarbon coating; FT IR, 1H,1H,2H,2H perfluorodecyl acrylate (PFDA); plasma enhanced chemical vapor deposition (PECVD); plasma polymerization; X Ray photoelectron spectroscopy (XPS)

Indexed keywords

CARRIER GAS; CHEMICAL COMPOSITIONS; CHEMICAL RETENTION; CONTINUOUS WAVES; COVERSLIPS; DC PLASMA; DEPOSITION PARAMETERS; DEPOSITION TIME; DUTY CYCLES; F/C RATIO; FLUOROCARBON COATINGS; FOURIER TRANSFORM INFRARED; FT-IR, 1H,1H,2H,2H-PERFLUORODECYL ACRYLATE (PFDA); LOW PRESSURES; OPERATING CONDITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); PLASMA MODE; PLASMA POWER; PLASMA-POLYMERIZED FLUOROCARBONS; PRECURSOR FLOW; PRECURSOR MOLECULES; RF PLASMA; SPECTROSCOPIC CHARACTERIZATION; XPS;

ARGON; COATINGS; DC POWER TRANSMISSION; DEPOSITION; ELECTRONS; FOURIER TRANSFORMS; PHOTOELECTRICITY; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASMA THEORY; POLYMER BLENDS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

PLASMA DEPOSITION;

EID: 78649540439     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201000043     Document Type: Article

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