"Mesh-assisted" colloidal lithography and plasma etching: A route to large-area, uniform, ordered nano-pillar and nanopost fabrication on versatile substrates

Microelectronic Engineering

Volumn 88, Issue 8, 2011, Pages 2547-2551

  Ellinas, Kosmas ^a   Smyrnakis, Athanasios ^a   Malainou, Antonia ^a   Tserepi, Angeliki ^a   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Colloidal lithography; Cryogenic etching; Microparticle lithography; Nanofabrication for life sciences; Nanomanufacturing for life sciences; Ordered nanopillars; Plasma etching; Superhydrophobic surfaces; Wetting control

Indexed keywords

COLLOIDAL LITHOGRAPHY; CRYOGENIC ETCHING; MICRO PARTICLES; NANO-MANUFACTURING; NANOPILLARS; SUPER-HYDROPHOBIC SURFACES; WETTING CONTROL;

ANISOTROPY; HYDROPHOBICITY; MONOLAYERS; PHOTOLITHOGRAPHY; PLASMA ETCHING; PLASMAS; POLYSTYRENES; SILICA; SPHERES; SUBSTRATES; SURFACE PROPERTIES;

ANISOTROPIC ETCHING;

EID: 79960035911     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.12.073     Document Type: Conference Paper

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