Nanostructured thin films prepared from cluster beams

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Solar P ^a   Polonskyi, O ^a   Choukourov, A ^a   Artemenko, A ^a   Hanus J ^a   Biederman, H ^a   Slavinska D ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Cluster source; Nanoclusters; Plasma polymers; Polymeric nanoclusters; RF discharge

Indexed keywords

AFM; CLUSTER BEAM DEPOSITION; CLUSTER BEAMS; CLUSTER SOURCE; DEPOSITION CONDITIONS; FTIR; HIGH DEPOSITION RATES; NANOSTRUCTURED THIN FILM; PLANAR MAGNETRON; PLASMA POLYMERS; POLYMERIC NANOCLUSTERS; RADIO FREQUENCIES; RF DISCHARGE; SILICON SUBSTRATES;

CHEMICAL MODIFICATION; DEPOSITION; ELECTRIC DISCHARGES; MAGNETRONS; NANOCLUSTERS; PLASMA DEPOSITION; POLYMER FILMS; POLYMERS; SIZE DISTRIBUTION;

FILM PREPARATION;

EID: 79959787596     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.01.059     Document Type: Article

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