-
1
-
-
33847634295
-
-
R. Martins, P. Barquinha, I. Ferreira, L. Pereira, G. Goncalves and E. Fortunato, J. Appl. Phys., 2007, 101, 044505.
-
(2007)
J. Appl. Phys.
, vol.101
, pp. 044505
-
-
Martins, R.1
Barquinha, P.2
Ferreira, I.3
Pereira, L.4
Goncalves, G.5
Fortunato, E.6
-
2
-
-
20644459026
-
-
N. Dehuff, E. Kettenring, D. Hong, H. Chiang, J. Wager, R. Hoffman, C. H. Park and D. Keszler, J. Appl. Phys., 2005, 97, 064505.
-
(2005)
J. Appl. Phys.
, vol.97
, pp. 064505
-
-
Dehuff, N.1
Kettenring, E.2
Hong, D.3
Chiang, H.4
Wager, J.5
Hoffman, R.6
Park, C.H.7
Keszler, D.8
-
3
-
-
79957994061
-
-
R. Theissmann, S. Bubel, M. Sanlialp, C. Busch, G. Schierning and R. Schmechel, Thin Solid Films, 2011, 519, 5623-5628.
-
(2011)
Thin Solid Films
, vol.519
, pp. 5623-5628
-
-
Theissmann, R.1
Bubel, S.2
Sanlialp, M.3
Busch, C.4
Schierning, G.5
Schmechel, R.6
-
4
-
-
84864762992
-
-
R. Chen, W. Zhou, M. Zhang and H. S. Kwok, Thin Solid Films, 2012, 520, 6681-6683.
-
(2012)
Thin Solid Films
, vol.520
, pp. 6681-6683
-
-
Chen, R.1
Zhou, W.2
Zhang, M.3
Kwok, H.S.4
-
6
-
-
52449126655
-
-
H. S. Kim, P. D. Byrne, A. Facchetti and T. J. Marks, J. Am. Chem. Soc., 2008, 130, 12580-12581.
-
(2008)
J. Am. Chem. Soc.
, vol.130
, pp. 12580-12581
-
-
Kim, H.S.1
Byrne, P.D.2
Facchetti, A.3
Marks, T.J.4
-
7
-
-
33748306075
-
-
L. Francioso, M. Russo, A. Taurino and P. Siciliano, Sens. Actuators, B, 2006, 119, 159-166.
-
(2006)
Sens. Actuators, B
, vol.119
, pp. 159-166
-
-
Francioso, L.1
Russo, M.2
Taurino, A.3
Siciliano, P.4
-
8
-
-
84856065597
-
-
K. Ebata, S. Tomai, Y. Tsuruma, T. Iitsuka, S. Matsuzaki and K. Yano, Appl. Phys. Express, 2012, 5, 1102.
-
(2012)
Appl. Phys. Express
, vol.5
, pp. 1102
-
-
Ebata, K.1
Tomai, S.2
Tsuruma, Y.3
Iitsuka, T.4
Matsuzaki, S.5
Yano, K.6
-
9
-
-
84857328937
-
-
P. Migliorato, M. Seok and J. Jang, Appl. Phys. Lett., 2012, 100, 073506.
-
(2012)
Appl. Phys. Lett.
, vol.100
, pp. 073506
-
-
Migliorato, P.1
Seok, M.2
Jang, J.3
-
10
-
-
67650486403
-
-
J. H. Lim, J. H. Shim, J. H. Choi, J. Joo, K. Park, H. Jeon, M. R. Moon, D. Jung, H. Kim and H. J. Lee, Appl. Phys. Lett., 2009, 95, 012108.
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 012108
-
-
Lim, J.H.1
Shim, J.H.2
Choi, J.H.3
Joo, J.4
Park, K.5
Jeon, H.6
Moon, M.R.7
Jung, D.8
Kim, H.9
Lee, H.J.10
-
11
-
-
78649460680
-
-
M. S. Park, D. H. Lee, E. J. Bae, D. H. Kim, J. G. Kang, D. H. Son and S. O. Ryu, Mol. Cryst. Liq. Cryst. Sci. Technol., 2010, 529, 137-146.
-
(2010)
Mol. Cryst. Liq. Cryst. Sci. Technol.
, vol.529
, pp. 137-146
-
-
Park, M.S.1
Lee, D.H.2
Bae, E.J.3
Kim, D.H.4
Kang, J.G.5
Son, D.H.6
Ryu, S.O.7
-
12
-
-
34250621864
-
-
D. H. Lee, Y. J. Chang, G. S. Herman and C. H. Chang, Adv. Mater., 2007, 19, 843-847.
-
(2007)
Adv. Mater.
, vol.19
, pp. 843-847
-
-
Lee, D.H.1
Chang, Y.J.2
Herman, G.S.3
Chang, C.H.4
-
13
-
-
77955034321
-
-
M. G. Kim, H. S. Kim, Y. G. Ha, J. He, M. G. Kanatzidis, A. Facchetti and T. J. Marks, J. Am. Chem. Soc., 2010, 132, 10352-10364.
-
(2010)
J. Am. Chem. Soc.
, vol.132
, pp. 10352-10364
-
-
Kim, M.G.1
Kim, H.S.2
Ha, Y.G.3
He, J.4
Kanatzidis, M.G.5
Facchetti, A.6
Marks, T.J.7
-
14
-
-
77953162588
-
-
J. Liu, D. B. Buchholz, R. P. H. Chang, A. Facchetti and T. J. Marks, Adv. Mater., 2010, 22, 2333-2337.
-
(2010)
Adv. Mater.
, vol.22
, pp. 2333-2337
-
-
Liu, J.1
Buchholz, D.B.2
Chang, R.P.H.3
Facchetti, A.4
Marks, T.J.5
-
16
-
-
78650380269
-
-
J. C. Park, S. Kim, C. Kim, I. Song, Y. Park, U. I. Jung, D. H. Kim and J. S. Lee, Adv. Mater., 2010, 22, 5512-5516.
-
(2010)
Adv. Mater.
, vol.22
, pp. 5512-5516
-
-
Park, J.C.1
Kim, S.2
Kim, C.3
Song, I.4
Park, Y.5
Jung, U.I.6
Kim, D.H.7
Lee, J.S.8
-
17
-
-
84861829395
-
-
E. Fortunato, P. Barquinha and R. Martins, Adv. Mater., 2012, 24, 2945-2986.
-
(2012)
Adv. Mater.
, vol.24
, pp. 2945-2986
-
-
Fortunato, E.1
Barquinha, P.2
Martins, R.3
-
18
-
-
77955598327
-
-
G. H. Kim, W. H. Jeong and H. J. Kim, Phys. Status Solidi A, 2010, 207, 1677-1679.
-
(2010)
Phys. Status Solidi a
, vol.207
, pp. 1677-1679
-
-
Kim, G.H.1
Jeong, W.H.2
Kim, H.J.3
-
19
-
-
9744248669
-
-
K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano and H. Hosono, Nature, 2004, 432, 488-492.
-
(2004)
Nature
, vol.432
, pp. 488-492
-
-
Nomura, K.1
Ohta, H.2
Takagi, A.3
Kamiya, T.4
Hirano, M.5
Hosono, H.6
-
20
-
-
0033615351
-
-
C. R. Kagan, D. B. Mitzi and C. D. Dimitrakopoulos, Science, 1999, 286, 945.
-
(1999)
Science
, vol.286
, pp. 945
-
-
Kagan, C.R.1
Mitzi, D.B.2
Dimitrakopoulos, C.D.3
-
21
-
-
84863821584
-
-
X. Liu, C. Wang, B. Cai, X. Xiao, S. Guo, Z. Fan, J. Li, X. Duan and L. Liao, Nano Lett., 2012, 12, 3596-3601.
-
(2012)
Nano Lett.
, vol.12
, pp. 3596-3601
-
-
Liu, X.1
Wang, C.2
Cai, B.3
Xiao, X.4
Guo, S.5
Fan, Z.6
Li, J.7
Duan, X.8
Liao, L.9
-
22
-
-
0042991275
-
-
A. Javey, J. Guo, Q. Wang, M. Lundstrom and H. Dai, Nature, 2003, 424, 654-657.
-
(2003)
Nature
, vol.424
, pp. 654-657
-
-
Javey, A.1
Guo, J.2
Wang, Q.3
Lundstrom, M.4
Dai, H.5
-
23
-
-
33749488968
-
-
S. Kumar, G. Blanchet, M. Hybertsen, J. Y. Murthy and M. A. Alam, Appl. Phys. Lett., 2006, 89, 143501.
-
(2006)
Appl. Phys. Lett.
, vol.89
, pp. 143501
-
-
Kumar, S.1
Blanchet, G.2
Hybertsen, M.3
Murthy, J.Y.4
Alam, M.A.5
-
24
-
-
77954145410
-
-
N. C. Su, S. J. Wang, C. C. Huang, Y. H. Chen, H. Y. Huang, C. K. Chiang and A. Chin, IEEE Electron Device Lett., 2010, 31, 680-682.
-
(2010)
IEEE Electron Device Lett.
, vol.31
, pp. 680-682
-
-
Su, N.C.1
Wang, S.J.2
Huang, C.C.3
Chen, Y.H.4
Huang, H.Y.5
Chiang, C.K.6
Chin, A.7
-
25
-
-
80052819859
-
-
J. Svensson, N. Lindahl, H. Yun, M. Seo, D. Midtvedt, Y. Tarakanov, N. Lindvall, O. Nerushev, J. Kinaret, S. Lee and E. E. B. Campbell, Nano Lett., 2011, 11, 3569-3575.
-
(2011)
Nano Lett.
, vol.11
, pp. 3569-3575
-
-
Svensson, J.1
Lindahl, N.2
Yun, H.3
Seo, M.4
Midtvedt, D.5
Tarakanov, Y.6
Lindvall, N.7
Nerushev, O.8
Kinaret, J.9
Lee, S.10
Campbell, E.E.B.11
-
26
-
-
84865046974
-
-
C. Avis, Y. G. Kim and J. Jang, J. Mater. Chem., 2012, 22, 17415-17420.
-
(2012)
J. Mater. Chem.
, vol.22
, pp. 17415-17420
-
-
Avis, C.1
Kim, Y.G.2
Jang, J.3
-
27
-
-
57349120035
-
-
N. Umezawa, M. Sato and K. Shiraishi, Appl. Phys. Lett., 2008, 93, 223104.
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 223104
-
-
Umezawa, N.1
Sato, M.2
Shiraishi, K.3
-
28
-
-
36249031554
-
-
H. Wu, J. Liang, G. Jin, Y. Lao and T. Xu, IEEE Trans. Electron Devices, 2007, 54, 2856-2859.
-
(2007)
IEEE Trans. Electron Devices
, vol.54
, pp. 2856-2859
-
-
Wu, H.1
Liang, J.2
Jin, G.3
Lao, Y.4
Xu, T.5
-
29
-
-
84863670549
-
-
M. Suh, M. Meyyappan and S. Ju, Nanotechnology, 2012, 23, 305203.
-
(2012)
Nanotechnology
, vol.23
, pp. 305203
-
-
Suh, M.1
Meyyappan, M.2
Ju, S.3
-
30
-
-
84861680341
-
-
J. C. Park, S. W. Kim, C. J. Kim and H. N. Lee, IEEE Electron Device Lett., 2012, 33, 809-811.
-
(2012)
IEEE Electron Device Lett.
, vol.33
, pp. 809-811
-
-
Park, J.C.1
Kim, S.W.2
Kim, C.J.3
Lee, H.N.4
-
31
-
-
84858334996
-
-
J. Y. Choi, S. S. Kim and S. Y. Lee, Thin Solid Films, 2011, 520, 3774-3777.
-
(2011)
Thin Solid Films
, vol.520
, pp. 3774-3777
-
-
Choi, J.Y.1
Kim, S.S.2
Lee, S.Y.3
-
33
-
-
78649594307
-
-
F. N. Ishikawa, M. Curreli, C. A. Olson, H. I. Liao, R. Sun, R. W. Roberts, R. J. Cote, M. E. Thompson and C. Zhou, ACS Nano, 2010, 4, 6914-6922.
-
(2010)
ACS Nano
, vol.4
, pp. 6914-6922
-
-
Ishikawa, F.N.1
Curreli, M.2
Olson, C.A.3
Liao, H.I.4
Sun, R.5
Roberts, R.W.6
Cote, R.J.7
Thompson, M.E.8
Zhou, C.9
-
34
-
-
79954581570
-
-
J. Y. Kwon, D. J. Lee and K. B. Kim, Electron. Mater. Lett., 2011, 7, 1-11.
-
(2011)
Electron. Mater. Lett.
, vol.7
, pp. 1-11
-
-
Kwon, J.Y.1
Lee, D.J.2
Kim, K.B.3
-
35
-
-
33745327664
-
-
J. Xiang, W. Lu, Y. Hu, Y. Wu, H. Yan and C. M. Lieber, Nature, 2006, 441, 489-493.
-
(2006)
Nature
, vol.441
, pp. 489-493
-
-
Xiang, J.1
Lu, W.2
Hu, Y.3
Wu, Y.4
Yan, H.5
Lieber, C.M.6
-
36
-
-
33645512970
-
-
H. Wang, J. Wang, X. Yan, J. Shi, H. Tian, Y. Geng and D. Yan, Appl. Phys. Lett., 2006, 88, 133508.
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 133508
-
-
Wang, H.1
Wang, J.2
Yan, X.3
Shi, J.4
Tian, H.5
Geng, Y.6
Yan, D.7
-
37
-
-
33645512970
-
-
H. Wang, J. Wang, X. Yan, J. Shi, H. Tian, Y. Geng and D. Yan, Appl. Phys. Lett., 2006, 88, 133508.
-
(2006)
Appl. Phys. Lett.
, vol.88
, pp. 133508
-
-
Wang, H.1
Wang, J.2
Yan, X.3
Shi, J.4
Tian, H.5
Geng, Y.6
Yan, D.7
-
38
-
-
78650292470
-
-
K. Banger, Y. Yamashita, K. Mori, R. Peterson, T. Leedham, J. Rickard and H. Sirringhaus, Nat. Mater., 2010, 10, 45-50.
-
(2010)
Nat. Mater.
, vol.10
, pp. 45-50
-
-
Banger, K.1
Yamashita, Y.2
Mori, K.3
Peterson, R.4
Leedham, T.5
Rickard, J.6
Sirringhaus, H.7
-
39
-
-
84863331671
-
-
L. Ding, S. Liang, T. Pei, Z. Zhang, S. Wang, W. Zhou, J. Liu and L. M. Peng, Appl. Phys. Lett., 2012, 100, 263116.
-
(2012)
Appl. Phys. Lett.
, vol.100
, pp. 263116
-
-
Ding, L.1
Liang, S.2
Pei, T.3
Zhang, Z.4
Wang, S.5
Zhou, W.6
Liu, J.7
Peng, L.M.8
-
40
-
-
22944446145
-
-
M. H. Yoon, H. Yan, A. Facchetti and T. J. Marks, J. Am. Chem. Soc., 2005, 127, 10388-10395.
-
(2005)
J. Am. Chem. Soc.
, vol.127
, pp. 10388-10395
-
-
Yoon, M.H.1
Yan, H.2
Facchetti, A.3
Marks, T.J.4
-
41
-
-
35348858083
-
-
M. S. Oh, D. Hwang, K. Lee, W. J. Choi, J. H. Kim, S. Im and S. Lee, J. Appl. Phys., 2007, 102, 076104.
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 076104
-
-
Oh, M.S.1
Hwang, D.2
Lee, K.3
Choi, W.J.4
Kim, J.H.5
Im, S.6
Lee, S.7
-
43
-
-
0025519250
-
-
T. Enoki, K. Arai and Y. Ishii, IEEE Electron Device Lett., 1990, 11, 502-504.
-
(1990)
IEEE Electron Device Lett.
, vol.11
, pp. 502-504
-
-
Enoki, T.1
Arai, K.2
Ishii, Y.3
-
44
-
-
10044267465
-
-
V. Reddy, A. T. Krishnan, A. Marshall, J. Rodriguez, S. Natarajan, T. Rost and S. Krishnan, Microelectron. Reliab., 2005, 45, 31-38.
-
(2005)
Microelectron. Reliab.
, vol.45
, pp. 31-38
-
-
Reddy, V.1
Krishnan, A.T.2
Marshall, A.3
Rodriguez, J.4
Natarajan, S.5
Rost, T.6
Krishnan, S.7
-
45
-
-
84863697039
-
-
Z. Liu, H. Li, Z. Qiu, S. L. Zhang and Z. B. Zhang, Adv. Mater., 2012, 24, 3633-3638.
-
(2012)
Adv. Mater.
, vol.24
, pp. 3633-3638
-
-
Liu, Z.1
Li, H.2
Qiu, Z.3
Zhang, S.L.4
Zhang, Z.B.5
|