메뉴 건너뛰기




Volumn 520, Issue 21, 2012, Pages 6681-6683

High performance self-aligned top-gate ZnO thin film transistors using sputtered Al 2O 3 gate dielectric

Author keywords

Aluminum oxide; Self aligned structure; Thin film transistors; Zinc oxide

Indexed keywords

ALUMINUM OXIDES; ALUMINUM TARGET; DRIVING DEVICE; FIELD-EFFECT MOBILITIES; ON/OFF CURRENT RATIO; OXYGEN AMBIENT; REACTIVE DC MAGNETRON SPUTTERING; ROOM TEMPERATURE; SELF-ALIGNED; SUBTHRESHOLD SWING; THIN-FILM TRANSISTOR (TFTS); ZINC OXIDE (ZNO); ZNO;

EID: 84864762992     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2012.06.066     Document Type: Article
Times cited : (29)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.