|
Volumn 520, Issue 21, 2012, Pages 6681-6683
|
High performance self-aligned top-gate ZnO thin film transistors using sputtered Al 2O 3 gate dielectric
|
Author keywords
Aluminum oxide; Self aligned structure; Thin film transistors; Zinc oxide
|
Indexed keywords
ALUMINUM OXIDES;
ALUMINUM TARGET;
DRIVING DEVICE;
FIELD-EFFECT MOBILITIES;
ON/OFF CURRENT RATIO;
OXYGEN AMBIENT;
REACTIVE DC MAGNETRON SPUTTERING;
ROOM TEMPERATURE;
SELF-ALIGNED;
SUBTHRESHOLD SWING;
THIN-FILM TRANSISTOR (TFTS);
ZINC OXIDE (ZNO);
ZNO;
ALUMINUM;
ALUMINUM COATINGS;
FLAT PANEL DISPLAYS;
GATE DIELECTRICS;
THIN FILMS;
TRANSISTORS;
ZINC OXIDE;
THIN FILM TRANSISTORS;
|
EID: 84864762992
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2012.06.066 Document Type: Article |
Times cited : (29)
|
References (12)
|