Controlling the formation of metallic nanoparticles on functionalized silicon surfaces

Journal of Physical Chemistry C

Volumn 116, Issue 27, 2012, Pages 14431-14444

  Perrine, Kathryn A ^a   Lin, Jia Ming ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL FUNCTIONALIZATION; COPPER DEPOSITION; CVD PROCESS; DENSITY FUNCTIONAL THEORY CALCULATIONS; ELECTRONIC DEVICE; FUNCTIONALIZED; FUNCTIONALIZED SURFACES; METAL ORGANIC PRECURSORS; METALLIC NANOPARTICLES; MOLECULAR LEVELS; NANOSTRUCTURE FORMATION; ROOM TEMPERATURE; SCALING DOWN; SEMICONDUCTOR SUBSTRATE; SI(1 0 0); SI(100) SURFACE; SILICON INTERFACE; SILICON SURFACES; SOLID SUBSTRATES; STRUCTURE AND PROPERTIES; SURFACE OXIDATIONS; SURFACE PROCESS; VINYLTRIMETHYLSILANE;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COPPER; DENSITY FUNCTIONAL THEORY; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); NANOSTRUCTURES; PHOTOELECTRONS; SILICON; SUBSTRATES; SURFACE REACTIONS; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 84863844382     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp3036555     Document Type: Article

References (71)

1. Arden, W.; Cogez, P.; Graref, M. International Technology Roadmap for Semiconductors. http://www.itrs.net/reports.html, 2009.
2. Rickerby, J.; Steinke, J. H. G. Chem. Rev. 2002, 102, 1525-1549
3. Rodríguez-Reyes, J. C. F.; Teplyakov, A. V. Chem.-Eur. J. 2007, 13, 9164-9176
4. Leftwich, T. R.; Teplyakov, A. V. Surf. Sci. Rep. 2007, 63, 1-71
5. Waltenburg, H. N.; Yates, J. T., Jr. Chem. Rev. 1995, 95, 1589-1673
6. Perrine, K. A.; Teplyakov, A. V. Chem. Soc. Rev. 2010, 39, 3256-3274
7. Plass, K. E.; Liu, X. L.; Brunschwig, B. S.; Lewis, N. S. Chem. Mater. 2008, 20, 2228-2233
8. Amy, S. R.; Michalak, D. J.; Chabal, Y. J.; Wielunski, L.; Hurley, P. T.; Lewis, N. S. J. Phys. Chem. C 2007, 111, 13053-13061
9. Rivillon, S.; Chabal, Y. J.; Webb, L. J.; Michalak, D. J.; Lewis, N. S.; Halls, M. D.; Raghavachari, K. J. Vac. Sci. Technol., A 2005, 23, 1100-1106
10. Bansal, A.; Li, X. L.; Yi, S. I.; Weinberg, W. H.; Lewis, N. S. J. Phys. Chem. B 2001, 105, 10266-10277
11. Okada, L. A.; George, S. M. Appl. Surf. Sci. 1999, 137, 113-124
12. Elam, J. W.; Schuisky, M.; Ferguson, J. D.; George, S. M. Thin Solid Films 2003, 436, 145-156
13. Rodríguez-Reyes, J. C. F.; Teplyakov, A. V. J. Phys. Chem. C 2007, 111, 16498-16505
14. Cadete Santos Aires, F. J.; Bertolini, J. C. Top. Catal. 2009, 52, 1492-1505
15. Klaus, J. W.; George, S. M. J. Electrochem. Soc. 2000, 147, 2658-2664
16. Xia, Y. D.; Mokaya, R. Angew. Chem., Int. Ed. 2003, 42, 2639-2644
17. Xia, Y. D.; Mokaya, R. J. Mater. Chem. 2004, 14, 2507-2515
18. Mayne, A. J.; Riedel, D.; Contet, G.; Dujardin, G. Prog. Surf. Sci. 2006, 81, 1-51
19. Owen, J. H. G. J. Phys.: Condens. Matter 2009, 21, 443001
20. Pirolli, L.; Teplyakov, A. V. J. Phys. Chem. B 2005, 109, 8462-8468
21. Pirolli, L.; Teplyakov, A. V. Surf. Sci. 2006, 600, 3313-3320
22. Pirolli, L.; Teplyakov, A. V. Surf. Sci. 2007, 601, 155-164
23. Ni, C. Y.; Zhang, Z. P.; Wells, M.; Beebe, T. P., Jr.; Pirolli, L.; Méndez de Leo, L. P.; Teplyakov, A. V. Thin Solid Films 2007, 515, 3030-3039
24. Dai, M.; Wang, Y.; Kwon, J.; Halls, M. D.; Chabal, Y. J. Nat. Mater. 209, 8, 825-830
25. Rodríguez-Reyes, J. C. F.; Teplyakov, A. V. Phys. Rev. B 2007, 76, 075348
26. Rodríguez-Reyes, J. C. F.; Teplyakov, A. V. Phys. Rev. B 2008, 78, 165314
27. Chabal, Y. J.; Higashi, G. S.; Raghavachari, K.; Burrows, V. A. J. Vac. Sci. Technol., A. 1989, 7, 2104-2109
28. Perrine, K. A.; Teplyakov, A. V. Langmuir 2010, 26, 12648-12658
29. Takeda, S.; Fukawa, M.; Hayashi, Y.; Matsumoto, K. Thin Solid Films 1999, 339, 220-224
30. Frisch, M. J. T.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Montgomery, J. A., Jr.; Vreven, T.; Kudin, K. N.; Burant, J. C., Gaussian 09, Gaussian, Inc., Wallingford CT, 2009.
31. Lee, C. T.; Yang, W. T.; Parr, R. G. Phys. Rev. B 1988, 37, 785-789
32. Becke, A. D. J. Chem. Phys. 1993, 98, 1372-1377
33. Pirolli, L.; Teplyakov, A. V. J. Phys. Chem. B 2006, 110, 4708-4716
34. Chabal, Y. J. J. Vac. Sci. Technol., A 1985, 3, 1448-1451
35. Chabal, Y. J. Phys. B 1991, 170, 447-456
36. Chabal, Y. J.; Raghavachari, K. Phys. Rev. Lett. 1985, 54, 1055-1058
37. Depla, D.; Haemers, J.; De Gryse, R. Plasma Sources Sci. Technol. 2002, 11.
38. Fallberg, A.; Ottosson, M.; Carlsson, J. O. Chem. Vapor Depos. 2009, 15, 300-305
39. Fallberg, A.; Ottosson, M.; Carlsson, J. O. J. Cryst. Growth 2010, 312, 1779-1784
40. Lu, Q. A.; Zhang, X.; Zhu, W.; Zhou, Y. N.; Zhou, Q. F.; Liu, L. L.; Wu, X. J. Phys. Status Solidi A 2011, 208, 874-877
41. Mathieu, C.; Bai, X. X.; Bournel, F.; Gallet, J. J.; Carniato, S.; Rochet, F.; Sirotti, F.; Silly, M. G.; Chauvet, C.; Krizmancic, D., Phys. Rev. B 2009, 79.
42. Leftwich, T. R.; Teplyakov, A. V. J. Electron Spectrosc. Relat. Phenom. 2009, 175, 31-40
43. Perrine, K. A.; Leftwich, T. R.; Weiland, C. R.; Madachik, M. R.; Opila, R. L.; Teplyakov, A. V. J. Phys. Chem. C 2009, 113, 6643-6653
44. Rodríguez-Reyes, J. C. F.; Ni, C. Y.; Bui, H. P.; Beebe, T. P., Jr.; Teplyakov, A. V. Chem. Mater. 2009, 21, 5163-5169
45. Hampden-Smith, M. J.; Kodas, T. T. Polyhedron 1995, 14, 699-732
46. Girolami, G. S.; Jeffries, P. M.; Dubois, L. H. J. Am. Chem. Soc. 1993, 115, 1015-1024
47. Mezhenny, S.; Lyubinetsky, I.; Choyke, W. J.; Yates, J. T., Jr. J. Appl. Phys. 1999, 85, 3368-3373
48. Besling, W. F. A.; Goossens, A.; Meester, B.; Schoonman, J. J. Appl. Phys. 1998, 83, 544-553
49. Kang, H. K.; Kang, S. B. Mater. Sci. Eng., A 2006, 428, 336-345
50. Perry, S. S.; Somorjai, G. A. J. Vac. Sci. Technol., A 1994, 12, 1513-1518
51. Wagner, C. D.; Riggs, W. M.; Davis, L. E.; Moulder, J. F.; Muilenberg, G. E. Handbook of X-ray Photoelectron Spectroscopy; Perkin-Elmer Corporation: Eden Prairie, MN, 1979.
52. Cheng, Y. L.; Chiu, T. J.; Wei, B. J.; Wang, H. J.; Wu, J.; Wang, Y. L. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.-Process. Meas., Phenom. 2010, 28, 567-572
53. Leftwich, T. R. Ph.D. Thesis, University of Delaware, 2009.
54. Faggin, M. F.; Green, S. K.; Clark, I. T.; Queeney, K. T.; Hines, M. A. J. Am. Chem. Soc. 2006, 128, 11455-11462
55. Chabal, Y. J. J. Mol. Struct. 1993, 292, 65-80
56. Queeney, K. T.; Fukidome, H.; Chaban, E. E.; Chabal, Y. J. J. Phys. Chem. B 2001, 105, 3903-3907
57. Bowler, D. R.; Owen, J. H. G. Phys. Rev. B 2007, 75, 155310
58. Chabal, Y. J. Phys. Rev. B 1984, 29, 3677-3680
59. Flowers, M. C.; Jonathan, N. B. H.; Liu, Y.; Morris, A. J. Chem. Phys. 1993, 99, 7038-7048
60. Flowers, M. C.; Jonathan, N. B. H.; Morris, A.; Wright, S. J. Chem. Phys. 1998, 108, 3342-3352
61. Srasra, M.; Delsarte, S.; Gaigneaux, E. M. Top. Catal. 2009, 52, 1541-1548
62. Ryan, E. T.; Molis, S.; Grill, A. J. Electrochem. Soc. 2010, 157, H78-H80
63. Cuenya, B. R. Thin Solid Films 2010, 518, 3127-3150
64. Somorjai, G. A.; Contreras, A. M.; Montano, M.; Rioux, R. M. Proc. Natl. Acad. Sci. U.S.A. 2006, 103, 10577-10583
65. Zaera, F. Chem. Rec. 2005, 5, 133-144
66. Bent, S. F.; Kachian, J. S.; Rodriguez-Reyes, J. C. F.; Teplyakov, A. V. Proc. Natl. Acad. Sci. U.S.A. 2011, 108, 956-960
67. Choi, J. H.; Cho, J. H. Phys. Rev. B 2011, 84.
68. Stair, P. C. J. Am. Chem. Soc. 1982, 104, 4044-4052
69. Aldinger, B. S.; Gupta, A.; Clark, I. T.; Hines, M. A. J. Appl. Phys. 2010, 107, 103520
70. Gupta, A.; Aldinger, B. S.; Faggin, M. F.; Hines, M. A. J. Chem. Phys. 2010, 133, 044710
71. Tian, F.; Taber, D. F.; Teplyakov, A. V. J. Am. Chem. Soc. 2011, 133, 20769-20777