Molecular view of copper deposition chemistry: (Hexafluoroacetylacetonate)Cu(vinyltrimethylsilane) on a Si(1 0 0)-2 × 1 surface

Surface Science

Volumn 600, Issue 16, 2006, Pages 3313-3320

  Pirolli, Laurent ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

Copper deposition; Density functional calculations; Infrared spectroscopy; Metal semiconductor interfaces; Precursor molecules

Indexed keywords

ADSORPTION; ANNEALING; COMPUTATIONAL METHODS; COPPER; DEPOSITION; LOW TEMPERATURE OPERATIONS; MOLECULAR DYNAMICS; PROBABILITY DENSITY FUNCTION; SINGLE CRYSTALS; ULTRAHIGH VACUUM;

COPPER DEPOSITION; DENSITY FUNCTIONAL CALCULATIONS; METAL-SEMICONDUCTOR INTERFACES; PRECURSOR MOLECULES;

SILICON;

EID: 33748077091     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.06.019     Document Type: Article

References (27)

1. Murarka S.P. Mater. Sci. Eng. R19 (1997) 87
2. Doppelt P. Microelectron. Eng. 37/38 (1997) 89
3. Doppelt P. Coord. Chem. Rev. 178-180 (1998) 1785
4. Hampden-Smith M.J., and Kodas T.T. Polyhedron 14 (1995) 699 Report number 53
5. Marcadal C., Richard E., Torres J., Palleau J., and Madar R. Microelectron. Eng. 37/38 (1997) 97
6. Nguyen T., Charneski L.J., and Hsu S.T. J. Electrochem. Soc. 144 (1997) 2829
7. Pirolli L., and Teplyakov A.V. J. Phys. Chem. B 109 (2005) 8462
8. L.P. Méndez De Leo, L. Pirolli, A.V. Teplyakov, J. Phys. Chem. B, in press.
9. Becke A.D. J. Chem. Phys. 98 (1993) 1372
10. Lee C., Yang W., and Parr R.G. Phys. Rev. B 37 (1988) 785
11. Frisch M.J.T., et al. Gaussian 03, Revision C.02 (2004), Gaussian Inc, Wallinford CT
12. Nachtigall P., Jordon K.D., and Janda K.C. J. Chem. Phys. 95 (1991) 8652
13. Konecny R., and Doren D.J. J. Chem. Phys. 106 (1997) 2426
14. Widjaja Y., Mysinger M.M., and Musgrave C.B. J. Phys. Chem. B 104 (2000) 2527
15. Mui C., Wang G.T., Bent S.F., and Musgrave C.B. J. Chem. Phys. 114 (2001) 10170
16. Watras M.J., and Teplyakov A.V. J. Phys. Chem. B 109 (2005) 8928
17. Dmitrenko O., Huang W., Polenova T.E., Francesconi L.C., Wingrave J.A., and Teplyakov A.V. J. Phys. Chem. B 107 (2003) 7747
18. Nigg H.L., and Masel R.I. J. Vac. Sci. Technol. A 16 (1998) 3259
19. Nigg H.L., and Masel R.I. Surf. Sci. 409 (1998) 428
20. Nigg H.L., and Masel R.I. J. Vac. Sci. Technol. A 17 (1999) 3477
21. Nigg H.L., and Masel R.I. Surf. Sci. 419 (1999) 97
22. Hong S.Q., Comrie C.M., Russell S.W., and Mayer J.W. J. Appl. Phys. 70 (1991) 3655
23. Donnelly V.M., and Gross M.E. J. Vac. Sci. Technol. A 11 (1992) 66
24. Girolami G.S., Jeffries P.M., and Dubois L.H. J. Am. Chem. Soc. 115 (1993) 1015
25. Parmeter J.E. J. Phys. Chem. 97 (1993) 11530
26. Dubois L.H., and Zegarski B.R. J. Electrochem. Soc. 139 (1992) 3295
27. Durig J.R., Natter W.J., and Johnson-Streusand M. Appl. Spectrosc. 34 (1980) 60