NH- termination of the Si(111) surface by wet chemistry

Journal of the American Chemical Society

Volumn 133, Issue 51, 2011, Pages 20769-20777

  Tian, Fangyuan ^a   Taber, Douglass F ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA TREATMENT; DFT CALCULATION; FUNCTIONALIZED; GOLD STANDARDS; H-SI (111); HYDROGEN-TERMINATED SI(111); INTERFACE PROPERTY; NITRO COMPOUNDS; POTENTIAL APPLICATIONS; ROOM TEMPERATURE; SI (1 1 1); SI-N BONDS; SILICON SURFACES; SINGLE-CRYSTALLINE; TETRAHYDROFURANS; WET CHEMISTRY;

CHLORINE; DENSITY FUNCTIONAL THEORY; FUNCTIONAL GROUPS; HYDROGEN; INFRARED SPECTROSCOPY; LEAD COMPOUNDS; ORGANIC SOLVENTS; OXYGEN; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICON;

AMINE; AMMONIA; CARBON; CHLORINE; HYDROGEN; NITROGEN; OXYGEN; SILICON; TETRAHYDROFURAN;

ARTICLE; BINDING AFFINITY; CHLORINATION; DENSITY FUNCTIONAL THEORY; HYDROGEN BOND; INFRARED SPECTROSCOPY; IONIZATION; OXIDATION; QUANTITATIVE ANALYSIS; ROOM TEMPERATURE; SIGNAL NOISE RATIO; STEREOCHEMISTRY; SURFACE PROPERTY; SYNTHESIS; TIME OF FLIGHT MASS SPECTROMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 84555178169     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja205140h     Document Type: Article

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