Effect of film thickness and the presence of surface fluorine on the structure of a thin barrier film deposited from tetrakis-(dimethylamino)-titanium onto a Si(100)-2 × 1 substrate

Thin Solid Films

Volumn 515, Issue 5, 2007, Pages 3030-3039

  Ni, Chaoying ^a   Zhang, Zhanping ^a   Wells, Matthew ^b   Beebe Jr , Thomas P ^a   Pirolli, Laurent ^a   Méndez De Leo, Lucila P ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

^b ION TOF USA Inc   (United States)

Author keywords

Depth profiling; Titanium carbonitride; Transmission electron microscopy (TEM); X ray photoelectron spectroscopy (XPS)

Indexed keywords

ANNEALING; DEPOSITION; FLUORINE; SILICON; SUBSTRATES; ULTRAHIGH VACUUM;

DEPTH PROFILING; FILM THICKNESS; THIN BARRIER FILMS; TITANIUM CARBONITRIDE;

THIN FILMS;

EID: 33845946509     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.08.046     Document Type: Article

References (58)

1. Chourasia A.R., and Chopra D.R. Thin Solid Films 266 (1995) 298
2. Ducroquet F., Achard H., Coudert F., Prévitali B., Lugand J.-F., Ulmer L., Farjot T., Gobil Y., Heitzmann M., Tedesco S., Nier M.-E., and Deleonibus S. IEEE Trans. Electron Devices 48 (2001) 1816
3. Yagishita A., Saito T., Nakajima K., Inumiya S., and Matsuo K. IEEE Trans. Electron Devices 48 (2001) 1604
4. Lau J.T., Prybyla J.A., and Theiss S.K. Appl. Phys. Lett. 76 (2000) 164
5. Motte P., Proust M., Torres J., Gobil Y., Morand Y., Palleau J., Pantel R., and Juhel M. Microelectron. Eng. 50 (2000) 369
6. Prybyla J.A., Chiang C.-M., and Dubois L.H. Mater. Res. Soc. Symp. Proc. 282 (1993) 281
7. Prybyla J.A., Chiang C.-M., and Dubois L.H. J. Electrochem. Soc. 140 (1993) 2695
8. Weiller B.H. Mater. Res. Soc. Symp. Proc. 282 (1993) 605
9. Dubois L.H. Polyhedron 13 (1994) 1329
10. Corneille J.S., Chen P.J., Truong C.M., Oh W.S., and Goodman D.W. J. Vac. Sci. Technol., A 13 (1995) 1116
11. Paranjpe A., and IslamRaja M. J. Vac. Sci. Technol., B 13 (1995) 2105
12. Kim D.-H., Cho S.-L., Kim K.-B., Kim J.J., Park J.W., and Kim J.J. Appl. Phys. Lett. 69 (1996) 4182
13. Shin H.-K., Shin H.-J., Lee J.-G., Kang S.-W., and Ahn B.-T. Chem. Mater. 9 (1997) 76
14. Kim D.-H., Lim G.T., Kim S.-K., Park J.W., and Lee J.-G. J. Vac. Sci. Technol., B 15 (1999) 2197
15. Min J.-S., Park H.-S., and Kang S.-W. Appl. Phys. Lett. 75 (1999) 1521
16. Kim D.-J., Jung Y.-B., Lee M.-B., Lee Y.-H., Lee J.-H., and Lee J.-H. Thin Solid Films 372 (2000) 276
17. Liu X., Wu Z., Cai H., Yang Y., Chen T., Vallet C.E., Zuhr R.A., Beach D.B., Peng Z.-H., Wu Y.-D., Concollino T.E., Rheingold A.L., and Xue Z. J. Am. Chem. Soc. 123 (2001) 8011
18. Cross J.B., and Schlegel H.B. Chem. Phys. Lett. 340 (2001) 343
19. Okada L.A., and George S.M. Appl. Surf. Sci. 137 (1999) 113
20. Lee J.-G., Kim J.-H., Shin H.-K., Park S.-J., Yun D.-J., and Kim G.-H. Mater. Res. Soc. Symp. Proc. 427 (1996) 371
21. Norton Jr. E.T., and Amato-Wierda C.C. Electrochem. Soc. Proc. 2001-13 (2001) 9
22. Buiting M.J., and Otterloo A.F. J. Electrochem. Soc. 139 (1992) 2580
23. Ritala M., Leskelä M., Rauhala E., and Haussalo P. J. Electrochem. Soc. 140 (1995) 2731
24. Perry A.J. Surf. Coat. Technol. 132 (2000) 21
25. Umanskii S.Y., Novoselov K.P., Minushev A.K., Siodmiak M., Frenking G., and Korkin A.A. J. Comput. Chem. 22 (2001) 1366
26. Harada Y., Akahori T., and Onoda H. Jpn. J. Appl. Phys. 33 (1994) 413
27. Silvestre A.J., Conde O., Vilar R., and Jeandin M. J. Mater. Sci. 29 (1993) 404
28. Croonen Y.H., and Verspui G. J. Phys. (Paris) IV 3 (1993) 209
29. Endle J.P., Sun Y.-M., White J.M., and Ekerdt J.G. J. Vac. Sci. Technol., A 16 (1998) 1262
30. Eizenberg M., Littau K., Ghanayem S., Mark A., Maeda Y., Chang M., and Sinha A.K. Appl. Phys. Lett. 65 (1994) 2416
31. Fuentes G.G., Elizalde E., and Sanz J.M. J. Appl. Phys. 90 (2001) 2737
32. Kozlowski J., Markowski J., Prajzner A., and Zdanowski J. Surf. Coat. Technol. 98 (1998) 1440
33. Bocharov S., Zhang Z., Beebe Jr. T.P., and Teplyakov A.V. Thin Solid Films 471 (2005) 159
34. Fix R.M., Gordon R.G., and Hoffman D.M. Chem. Mater. 2 (1990) 235
35. Olowolafe J.O., Li J., Mayer J.W., and Colgan E.G. Appl. Phys. Lett. 58 (1991) 469
36. Bulanin K., Shah A.G., and Teplyakov A.V. J. Chem. Phys. 115 (2001) 7178
37. Kirsch P.D., and Ekerdt J.G. J. Appl. Phys. 90 (2001) 4256
38. Rochefort A., Bertolini J.C., Aboni M., and Delichere P. Surf. Sci. 294 (1990) 43
39. Barr T.L. J. Phys. Chem. 82 (1978) 1801
40. Wagner C.D., Moulder J.F., Davis L.E., Riggs W.M., and Muilenberg G.E. Handbook of X-Ray Photoelectron Spectroscopy (1979), Eden Prairie, Minnesota, Perkin Elmer Corporation
41. Czanderna A.W., King D.E., and Dake L.S. Solid State Sci. 2 (2000) 781
42. Briggs D., and Seah M.P. Practical Surface Analysis (1993), John Wiley & Sons
43. Cook M.G., and McIntyre N.S. Anal. Chem. 47 (1975) 2208
44. Haemers G., Verbist J.J., and Maroie S. Appl. Surf. Sci. 17 (1984) 463
45. Apen E., Rogers B.R., and Sellers J.A. J. Vac. Sci. Technol., A 16 (1998) 1227
46. Vasquez R.P. Surf. Sci. Spectra 2 (1994) 155
47. Wang L., Angert N., Trautmann C., and Vetter J. Synth. Met. 67 (1994) 121
48. Chua H.N., Pey K.L., Lai W.H., Chai J.W., Pan J.S., Chua D.H.C., and Siah S.Y. J. Vac. Sci. Technol., B 19 (2001) 2252
49. Oehrlein G.S., Clabes J.G., and Spirito P. J. Electrochem. Soc. 133 (1986) 1002
50. Clark D.T., and Shuttleworth D. J. Polym. Sci. Polym. Ed. 17 (1979) 1317
51. Zazzera L.A., and Moulder J.F. J. Electrochem. Soc. 136 (1989) 484
52. Vossen J.L., Thomas III J.H., Maa J.-S., Mesker O.R., and Fowler G.O. J. Vac. Sci. Technol., A 1 (1983) 1452
53. Weinberger B.R., Peterson T.C., Eschrich T.C., and Krasinski H.A. J. Appl. Phys. 60 (1986) 3232
54. Kaufherr N., and Lichtman D. J. Vac. Sci. Technol. 3 (1985) 1969
55. Bertóti I., Mohai M., Sullivan J.L., and Saied S.O. Appl. Surf. Sci. 84 (1995) 357
56. Ruhl G., Rehmet R., Knižová M., Merica R., and Veprek S. Chem. Mater. 8 (1996) 2712
57. Delfino M., Chung B.-C., Tsai W., and Salimian S. J. Appl. Phys. 72 (1992) 3718
58. Moulder J.F., Stickle W.F., Sobol P.E., and Bomben K.D. Handbook of X-Ray Photoelectron Spectroscopy (1995), Physical Electronics, Inc.