Metallic nanostructure formation limited by the surface hydrogen on silicon

Langmuir

Volumn 26, Issue 15, 2010, Pages 12648-12658

  Perrine, Kathryn A ^a   Teplyakov, Andrew V ^a  

^a UNIVERSITY OF DELAWARE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALTERNATIVE METHODS; CONTAMINATION PROBLEM; COPPER DEPOSITION; COPPER FILMS; COPPER NANOPARTICLES; COPPER NUCLEATION; DEPOSITION PROCESS; ELECTRONIC DEVICE; GASPHASE; HYDROGEN TERMINATION; INITIAL STAGES; METAL DEPOSITION; METAL GROWTH; METAL ORGANIC PRECURSORS; METALLIC COPPER; METALLIC NANOSTRUCTURE; MOLECULAR HYDROGEN; MOLECULAR LEVELS; NANOPARTICLE GROWTHS; NANOSTRUCTURE GROWTH; PRECURSOR MOLECULES; ROOM TEMPERATURE; SEM; SI (1 1 1); SI(1 0 0); SILICON SURFACES; SINGLE-CRYSTALLINE; SOLID SUBSTRATES; SPECTROSCOPIC EVIDENCE; SURFACE HYDROGEN; SURFACE MODIFICATION METHODS; VINYLTRIMETHYLSILANE; X-RAY ENERGY DISPERSIVE SPECTROSCOPY;

ADSORPTION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; HYDROGEN; METALS; NANOPARTICLES; REDUCING AGENTS; SCANNING ELECTRON MICROSCOPY; WATER COOLING SYSTEMS;

COPPER;

EID: 77954918773     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la100269m     Document Type: Article

References (72)

1. Arden, W., Cogez, P., and Graref, M. http://www.itrs.net/reports.html, 2007.
2. Frank, M. M., Wang, Y., Ho, M. T., Brewer, R. T., Moumen, N., and Chabal, Y. J. J. Electrochem. Soc. 2007, 154, G44-G48
3. Ho, M. T., Wang, Y., Brewer, R. T., Wielunski, L. S., Chabal, Y. J., Moumen, N., and Boleslawski, M. Appl. Phys. Lett. 2005, 87, 133103
4. Zaera, F. J. Mater. Chem. 2008, 18, 3521-3526
5. Schumacher, M., Baumann, P. K., and Seidel, T. Chem. Vap. Deposition 2006, 12, 99-108
6. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. J. Phys. Chem. C 2007, 111, 16498-16505
7. Li, Z. W., Rahtu, A., and Gordon, R. G. J. Electrochem. Soc. 2006, 153, C787-C794
8. Dai, M., Kwon, J., Langereis, E., Wielunski, L., Chabal, Y. J., Li, Z., and Gordon, R. G. ECS Trans. 2007, 11, 91-101
9. Perrine, K. A. and Teplyakov, A. V. Chem. Soc. Rev. 2010, DOI: 10.1039/b822965c.
10. Rodríguez-Reyes, J. C. F. and Teplyakov, A. V. Chem.-Eur. J. 2007, 13, 9164-9176
11. Park, K. J., Terry, D. B., Stewart, S. M., and Parsons, G. N. Langmuir 2007, 23, 6106-6112
12. Kelly, M. J., Han, J. H., Musgrave, C. B., and Parsons, G. N. Chem. Mater. 2005, 17, 5305-5314
13. Rickerby, J. and Steinke, J. H. G. Chem. Rev. 2002, 102, 1525-1549
14. Leftwich, T. R. and Teplyakov, A. V. Surf. Sci. Rep. 2007, 63, 1-71
15. Leftwich, T. R., Madachik, M. R., and Teplyakov, A. V. J. Am. Chem. Soc. 2008, 130, 16216-16223
16. Bent, S. F. Nat. Nanotechnol. 2008, 3, 185-186
17. Lopinski, G. P., Wayner, D. D. M., and Wolkow, R. A. Nature 2000, 406, 48-51
18. Buriak, J. M. Chem. Rev. 2002, 102, 1271-1308
19. Bent, S. F. Surf. Sci. 2002, 500, 879-903
20. Haber, J. A. and Lewis, N. S. J. Phys. Chem. B 2002, 106, 3639-3656
21. Hamers, R. J. Annu. Rev. Anal. Chem. 2008, 1, 707-736
22. Perrine, K. A., Leftwich, T. R., Weiland, C. R., Madachik, M. R., Opila, R. L., and Teplyakov, A. V. J. Phys. Chem. C 2009, 113, 6643-6653
23. Yang, L. and Doren, D. J. J. Phys. Chem. C 2008, 112, 781-785
24. Michalak, D. J., Amy, S. R., Esteve, A., and Chabal, Y. J. J. Phys. Chem. C 2008, 112, 11907-11919
25. Wayner, D. D. M. and Wolkow, R. A. J. Chem. Soc., Perkin Trans. 2 2002, 23-34
26. Amy, S. R., Michalak, D. J., Chabal, Y. J., Wielunski, L., Hurley, P. T., and Lewis, N. S. J. Phys. Chem. C 2007, 111, 13053-13061
27. Michalak, D. J., Rivillon, S., Chabal, Y. J., Esteve, A., and Lewis, N. S. J. Phys. Chem. B 2006, 110, 20426-20434
28. Bateman, J. E., Eagling, R. D., Horrocks, B. R., and Houlton, A. J. Phys. Chem. B 2000, 104, 5557-5565
29. Pirolli, L. and Teplyakov, A. V. J. Phys. Chem. B 2005, 109, 8462-8468
30. Pirolli, L. and Teplyakov, A. V. Surf. Sci. 2006, 600, 3313-3320
31. Pirolli, L. and Teplyakov, A. V. Surf. Sci. 2007, 601, 155-164
32. Ni, C. Y., Zhang, Z. P., Wells, M., Beebe, T. P., Pirolli, L., Méndez De Leo, L. P., and Teplyakov, A. V. Thin Solid Films 2007, 515, 3030-3039
33. Cicero, R. L., Chidsey, C. E. D., Lopinski, G. P., Wayner, D. D. M., and Wolkow, R. A. Langmuir 2002, 18, 305-307
34. Zikovsky, J., Dogel, S. A., Dickie, A. J., Pitters, J. L., and Wolkow, R. A. J. Vac. Sci. Technol., A 2009, 27, 248-252
35. Pei, Y., Ma, J., and Zeng, X. C. J. Phys. Chem. C 2008, 112, 16078-16086
36. Mayne, A. J., Riedel, D., Comtet, G., and Dujardin, G. Prog. Surf. Sci. 2006, 81, 1-51
37. Mayne, A. J., Dujardin, G., Comtet, G., and Riedel, D. Chem. Rev. 2006, 106, 4355-4378
38. Kolasinski, K. W. Curr. Opin. Solid State Mater. Sci. 2004, 8, 353-366
39. Hamers, R. J. Surf. Sci. 2006, 600, 3361-3362
40. Chiang, C. M., Gates, S. M., Lee, S. S., Kong, M., and Bent, S. F. J. Phys. Chem. B 1997, 101, 9537-9547
41. Higashi, G. S., Becker, R. S., Chabal, Y. J., and Becker, A. J. Appl. Phys. Lett. 1991, 58, 1656-1658
42. Queeney, K. T., Fukidome, H., Chaban, E. E., and Chabal, Y. J. J. Phys. Chem. B 2001, 105, 3903-3907
43. Chabal, Y. J., Higashi, G. S., Raghavachari, K., and Burrows, V. A. J. Vac. Sci. Technol., A. 1989, 7, 2104-2109
44. Zhang, X., Garfunkel, E., Chabal, Y. J., Christman, S. B., and Chaban, E. E. Appl. Phys. Lett. 2001, 79, 4051-4053
45. Chabal, Y. J. and Raghavachari, K. Phys. Rev. Lett. 1985, 54, 1055-1058
46. Klapetek, P., Decas, D., and Anderson, C. Gwyddion: An SPM data visualization and analysis tool, version 2.9, 2008.
47. Pirolli, L. and Teplyakov, A. V. J. Phys. Chem. B 2006, 110, 4708-4716
48. Jakob, P. and Chabal, Y. J. J. Chem. Phys. 1991, 95, 2897-2909
49. Faggin, M. F., Green, S. K., Clark, I. T., Queeney, K. T., and Hines, M. A. J. Am. Chem. Soc. 2006, 128, 11455-11462
50. Wolkow, R. A. Annu. Rev. Phys. Chem. 1999, 50, 413-441
51. Flowers, M. C., Jonathan, N. B. H., Liu, Y., and Morris, A. J. Chem. Phys. 1993, 99, 7038-7048
52. Flowers, M. C., Jonathan, N. B. H., Morris, A., and Wright, S. J. Chem. Phys. 1998, 108, 3342-3352
53. Chabal, Y. J. and Raghavachari, K. Phys. Rev. Lett. 1984, 53, 282-285
54. Niwano, M., Terashi, M., and Kuge, J. Surf. Sci. 1999, 420, 6-16
55. Flowers, M. C., Jonathan, N. B. H., Morris, A., and Wright, S. Surf. Sci. 1996, 351, 87-102
56. Girolami, G. S., Jeffries, P. M., and Dubois, L. H. J. Am. Chem. Soc. 1993, 115, 1015-1024
57. Parmeter, J. E. J. Phys. Chem. 1993, 97, 11530-11541
58. Farkas, J., Hampden-Smith, M. J., and Kodas, T. T. J. Electrochem. Soc. 1994, 141, 3539-3546
59. Jain, A., Gelatos, A. V., Kodas, T. T., Hampden-Smith, M. J., Marsh, R., and Mogab, C. J. Thin Solid Films 1995, 262, 52-59
60. Jain, A., Chi, K. M., Kodas, T. T., and Hampden-Smith, M. J. J. Electrochem. Soc. 1993, 140, 1434-1439
61. Jain, A., Kodas, T. T., Jairath, R., and Hampden-Smith, M. J. J. Vac. Sci. Technol., B 1993, 11, 2107-2113
62. Chung, Y. S., Lee, H. S., Lee, Y. S., and Kim, S. Surf. Sci. 2001, 482, 312-317
63. Hampden-Smith, M. J. and Kodas, T. T. Chem. Vap. Deposition 1995, 1, 8-23
64. Hampden-Smith, M. J. and Kodas, T. T. Chem. Vap. Deposition 1995, 1, 39-48
65. Braeckelmann, G., Manger, D., Burke, A., Peterson, G. G., Kaloyeros, A. E., Reidsema, C., Omstead, T. R., Loan, J. F., and Sullivan, J. J. J. Vac. Sci. Technol., B 1996, 14, 1828-1836
66. Jain, A., Kodas, T. T., Corbitt, T. S., and Hampden-Smith, M. J. Chem. Mater. 1996, 8, 1119-1127
67. Barr, T. L. Modern ESCA: The Principles and Practice of X-Ray Photoelectron Spectroscopy; CRC Press: Boca Raton, FL, 1994; p 254.
68. Wagner, C. D., Riggs, W. M., Davis, L. E., and Moulder, J. F.; In Handbook of X-Ray Photoelectron Spectroscopy, 1st ed.; Perkin-Elmer Corporation: Eden Prairie, MN, 1979.
69. Mezhenny, S., Lyubinetsky, I., Choyke, W. J., and Yates, J. T. J. Appl. Phys. 1999, 85, 3368-3373
70. Tatsumura, K., Watanabe, T., Hara, K., Hoshino, T., and Ohdomari, I. Phys. Rev. B 2001, 64, 115406.
71. Zhou, J. and Chen, D. A. Surf. Sci. 2003, 527, 183-197
72. Reddic, J. E., Zhou, J., and Chen, D. A. Surf. Sci. 2001, 494, L767-L772