In-situ spectroscopic ellipsometry of the Cu deposition process from supercritical fluids: Evidence of an abnormal surface layer formation

Japanese Journal of Applied Physics

Volumn 51, Issue 5 PART 2, 2012, Pages

  Sasaki, Takuya ^a   Tamegai, Yukihiro ^a   Ueno, Takahiro ^a   Watanabe, Mitsuhiro ^a   Jin, Lianhua ^a   Kondoh, Eiichi ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CU DEPOSITION; CU SURFACES; DEPOSITION KINETICS; DIELECTRIC LAYER; ELLIPSOMETRIC PARAMETERS; HIGH REFRACTIVE INDEX; HYDROGEN REDUCTION; IN-SITU; ISLAND FORMATION; LARGE DEVIATIONS; MODEL ANALYSIS; OPTICAL METROLOGY; SINGLE-LAYER MODELS; SUPERCRITICAL CARBON DIOXIDE FLUIDS; SUPERCRITICAL FLUID PROCESSING; SURFACE LAYERS; VAPOR GROWTH;

CARBON DIOXIDE; CHEMISORPTION; EFFLUENT TREATMENT; HYDROGEN; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; SUPERCRITICAL FLUID EXTRACTION; SUPERCRITICAL FLUIDS; TITANIUM NITRIDE;

REFRACTIVE INDEX;

EID: 84861509257     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.51.05EA02     Document Type: Conference Paper

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