Toward a unified reaction mechanism for chemical vapor deposition of copper

Journal of the Electrochemical Society

Volumn 145, Issue 1, 1998, Pages 347-352

  Borgharkar, Narendra S ^a   Griffin, Gregory L ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; COPPER; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REGRESSION ANALYSIS; SUBSTRATES; THIN FILMS;

DISPROPORTIONATION; GROWTH RATE; NONLINEAR REGRESSION;

REACTION KINETICS;

EID: 0031677830     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838258     Document Type: Article

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