Deposition of conformal copper and nickel films from supercritical carbon dioxide

Science

Volumn 294, Issue 5540, 2001, Pages 141-145

  Blackburn, J M ^a   Long, D P ^a   Cabanas A ^a   Watkins, J J ^a  

^a University of Massachusetts   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDES; SUBSTRATES;

PLANAR;

ORGANOMETALLICS;

BIS(CYCLOPENTADIENYL)NICKEL; CARBON DIOXIDE; COPPER; HYDROGEN; NICKEL; ORGANOMETALLIC COMPOUND; OXIDE; SILICON; UNCLASSIFIED DRUG;

CARBON DIOXIDE; COPPER; NICKEL;

ARTICLE; ELECTRONICS; FILM; INTEGRATED CIRCUIT; PRIORITY JOURNAL; REDUCTION; SEMICONDUCTOR; TEMPERATURE;

EID: 0035812811     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.1064148     Document Type: Article

References (12)