Characteristics of copper deposition in a supercritical CO2 fluid

Microelectronic Engineering

Volumn 64, Issue 1-4, 2002, Pages 495-499

  Kondoh, E ^a   Kato, H ^a  

^a UNIVERSITY OF YAMANASHI   (Japan)

Author keywords

Copper; Cu(hfac)2; Deposition; Supercritical carbon dioxide; Thin films

Indexed keywords

ASPECT RATIO; CARBON DIOXIDE; COPPER; DEPOSITION; HYDROGEN; SUBSTRATES; SUPERCRITICAL FLUIDS; X RAY PHOTOELECTRON SPECTROSCOPY;

CONDUCTIVE SUBSTRATES;

THIN FILMS;

EID: 0036776430     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00826-2     Document Type: Article

References (12)