SCOPUS 정보 검색 플랫폼

Advanced Materials

Volumn 12, Issue 12, 2000, Pages 913-915

Chemical fluid deposition: A hybrid technique for low-temperature metallization

(3) Long, David P a Blackburn, Jason M a Watkins, James J a

a University of Massachusetts (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CHEMICAL VAPOR DEPOSITION; ELECTROPLATING; LOW TEMPERATURE EFFECTS; METALLIZING; ORGANIC SOLVENTS; REDUCTION; TRANSPORT PROPERTIES;

CHEMICAL FLUID DEPOSITION (CFD);

ORGANOMETALLICS;

EID: 0033701031 PISSN: 09359648 EISSN: None Source Type: Journal
DOI: 10.1002/1521-4095(200006)12:12<913::AID-ADMA913>3.0.CO;2-# Document Type: Article

Times cited : (120)

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