SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 88, Issue 5, 2011, Pages 623-626

In situ ellipsometry of porous low-dielectric constant films in supercritical carbon dioxide

(2) Kondoh, Eiichi a Aruga, Shosaku a

a UNIVERSITY OF YAMANASHI (Japan)

Author keywords

Ellipsometry; Porous low dielectric constant films; Supercritical carbon dioxide

Indexed keywords

DIELECTRIC CONSTANTS; ELLIPSOMETRIC MEASUREMENTS; ELLIPSOMETRIC PARAMETERS; IN-SITU; IN-SITU ELLIPSOMETRY; LOW DIELECTRIC CONSTANTS; LOW-DIELECTRIC CONSTANT FILM; LOW-K FILMS; MEASUREMENT CONDITIONS; MICROPORES; POROUS LOW-DIELECTRIC CONSTANT FILMS; SPIN-ON; SUPERCRITICAL CARBON DIOXIDES; SUPERCRITICAL CO;

CARBON DIOXIDE; CARBON FILMS; CHEMICAL DETECTION; DIELECTRIC FILMS; ELLIPSOMETRY; ORGANIC SOLVENTS;

SUPERCRITICAL FLUID EXTRACTION;

EID: 79952489327 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2010.05.008 Document Type: Conference Paper

Times cited : (1)

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