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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5799-5802

Deposition of Ru thin films from supercritical carbon dioxide fluids

(1) Kondoh, Eiichi a

a UNIVERSITY OF YAMANASHI (Japan)

Author keywords

Ruthenium; Supercritical fluids; Thin film deposition

Indexed keywords

CARBON DIOXIDE; REDUCTION; RUTHENIUM; SUPERCRITICAL FLUIDS;

BARRIER METALS; REDUCTION CHEMISTRY; THIN FILM DEPOSITION;

THIN FILMS;

EID: 31844443795 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.5799 Document Type: Article

Times cited : (43)

References (18)

1
- 0036776430
- E. Kondoh and H. Kalo: Microelectron. Eng. 64 (2002) 495.
- (2002) Microelectron. Eng. , vol.64 , pp. 495
- Kondoh, E.¹ Kalo, H.²

2
- 4444229938
- Material Research Society, PA
- E. Kondoh: Proc. Advanced Metallization Conf. 2002 (Material Research Society, PA, 2003) p. 463.
- (2003) Proc. Advanced Metallization Conf. 2002 , pp. 463
- Kondoh, E.¹

3
- 84944057968
- E. Kondoh, V. Vezin, K. Shigama, S. Sunada, K. Kubo and T. Ohta: Proc. 2003 IEEE Int. Interconnect Technology Conf., p. 141.
- Proc. 2003 IEEE Int. Interconnect Technology Conf. , pp. 141
- Kondoh, E.¹ Vezin, V.² Shigama, K.³ Sunada, S.⁴ Kubo, K.⁵ Ohta, T.⁶

4
- 4444265349
- Material Research Society, PA
- E. Kondoh and K. Shigama: Proc. Advanced Metallization Conf. 2003 (Material Research Society, PA, 2004) p. 583.
- (2004) Proc. Advanced Metallization Conf. 2003 , pp. 583
- Kondoh, E.¹ Shigama, K.²

5
- 8644275576
- E. Kondoh, M. Hishikawa, M. Yanagihara and K. Shigama: Proc. 2004 IEEE Int. Interconnect Technology Conf., p. 33.
- Proc. 2004 IEEE Int. Interconnect Technology Conf. , pp. 33
- Kondoh, E.¹ Hishikawa, M.² Yanagihara, M.³ Shigama, K.⁴

6
- 4444283754
- E. Kondoh: Jpn. J. Appl. Phys. 43 (2004) 3928.
- (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 3928
- Kondoh, E.¹

7
- 3142626634
- I. Goswami and R. Laxman: Semicond. Int. 27 (2004) 49.
- (2004) Semicond. Int. , vol.27 , pp. 49
- Goswami, I.¹ Laxman, R.²

8
- 0022162031
- M. L. Green, M. E. Gross, L. E. Papa, K. J. Schnoes and D. Brasen: J. Electrochem. Soc. 132 (1985) 2677.
- (1985) J. Electrochem. Soc. , vol.132 , pp. 2677
- Green, M.L.¹ Gross, M.E.² Papa, L.E.³ Schnoes, K.J.⁴ Brasen, D.⁵

9
- 0033891549
- S.-E. Park, H.-M. Kim, K.-B. Kim and S.-H. Min: J. Electrochem. Soc. 147 (2000) 203.
- (2000) J. Electrochem. Soc. , vol.147 , pp. 203
- Park, S.-E.¹ Kim, H.-M.² Kim, K.-B.³ Min, S.-H.⁴

10
- 0035262730
- Y. Matsui, M. Hiratani, T. Nabatame, Y. Shimamoto and S. Kimura: Electrochem. Solid-State Lett. 4 (2001) C9.
- (2001) Electrochem. Solid-State Lett. , vol.4
- Matsui, Y.¹ Hiratani, M.² Nabatame, T.³ Shimamoto, Y.⁴ Kimura, S.⁵

11
- 31844444250
- note
- WinZone is a trademark of Iwatani International.

12
- 0033884603
- S. Y. Kang, K. H. Choi, S. K. Lee, C. S. Hwang and H. J. Kim: J. Electrochem. Soc. 147 (2000) 1161.
- (2000) J. Electrochem. Soc. , vol.147 , pp. 1161
- Kang, S.Y.¹ Choi, K.H.² Lee, S.K.³ Hwang, C.S.⁴ Kim, H.J.⁵

13
- 0034316091
- T. Nabetame, M. Hiratani, M. Kodoshima, Y. Shimamoto, Y. Matsui, Y. Ohji, I. Asano, T. Fujiwara and T. Suzuki: Jpn. J. Appl. Phys. 39 (2000) L1188.
- (2000) Jpn. J. Appl. Phys. , vol.39
- Nabetame, T.¹ Hiratani, M.² Kodoshima, M.³ Shimamoto, Y.⁴ Matsui, Y.⁵ Ohji, Y.⁶ Asano, I.⁷ Fujiwara, T.⁸ Suzuki, T.⁹

14
- 0002598478
- F.-J. Lee, Y. Chi, C.-S. Liu, P.-F. Hsu, T.-Y. Chou, S.-M. Peng and G.-H. Lee: Chemical Vapour Deposition 7 (2001) 99.
- (2001) Chemical Vapour Deposition , vol.7 , pp. 99
- Lee, F.-J.¹ Chi, Y.² Liu, C.-S.³ Hsu, P.-F.⁴ Chou, T.-Y.⁵ Peng, S.-M.⁶ Lee, G.-H.⁷

15
- 0001254260
- T. Aoyama, M. Kiyotoshi, S. Yamazaki and K. Eguchi: Jpn. J. Appl. Phys. 38 (1999) 2194.
- (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 2194
- Aoyama, T.¹ Kiyotoshi, M.² Yamazaki, S.³ Eguchi, K.⁴

16
- 0015604484
- R. B. McLellan and W. A. Gates: Acta Metall. 21 (1973) 181.
- (1973) Acta Metall. , vol.21 , pp. 181
- McLellan, R.B.¹ Gates, W.A.²

17
- 0029375618
- N. Awaya, K. Ohno and Y. Arita: J. Electrochem. Soc. 142 (1995) 3173.
- (1995) J. Electrochem. Soc. , vol.142 , pp. 3173
- Awaya, N.¹ Ohno, K.² Arita, Y.³

18
- 78650138987
- E. Kondoh and T. Ohta: J. Vac. Sci. & Technol. A 13 (1995) 2863.
- (1995) J. Vac. Sci. & Technol. A , vol.13 , pp. 2863
- Kondoh, E.¹ Ohta, T.²

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