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Volumn 23, Issue 19, 2012, Pages

Temperature-dependent nonradiative recombination processes in GaN-based nanowire white-light-emitting diodes on silicon

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE REGIONS; ALGAN; AUGER RECOMBINATION; CARRIER RECOMBINATION; ELECTRON BLOCKING LAYER; ELECTRON OVERFLOW; EMISSION CHARACTERISTICS; FOUR-ORDER; INGAN/GAN; INJECTION CONDITIONS; NANO SCALE; NON-RADIATIVE LIFETIMES; NONRADIATIVE RECOMBINATION PROCESS; ROOM TEMPERATURE; SHOCKLEY-READ-HALL; SHOCKLEY-READ-HALL RECOMBINATIONS; SURFACE RECOMBINATION VELOCITIES; TEMPERATURE DEPENDENT; WHITE LIGHT EMISSION; WHITE LIGHT EMITTING DIODES; WIRE DIAMETER;

EID: 84860322822     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/19/194012     Document Type: Article
Times cited : (80)

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