Deposition of silicon nitride thin films by RF magnetron sputtering: A material and growth process study

Optical Materials

Volumn 34, Issue 4, 2012, Pages 632-638

  Signore, M A ^a   Sytchkova, A ^b   Dimaio, D ^a   Cappello, A ^a   Rizzo, A ^a  

^a ENEA Technical Unit Material Technology   (Italy)

^b ENEA   (Italy)

Author keywords

FTIR; Silicon nitride; SIMS; Sputtering deposition

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; GASES; IONIZATION OF GASES; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; SECONDARY ION MASS SPECTROMETRY; SILICON NITRIDE; THIN FILMS;

FOURIER TRANSFORM INFRARED; FTIR; NITROGEN DISSOCIATION; RF-MAGNETRON SPUTTERING; SECONDARY ION MASS SPECTROSCOPY; SILICON NITRIDE THIN FILMS; SPUTTERING DEPOSITION; STOICHIOMETRIC FILMS;

OPTICAL FILMS;

EID: 84855890286     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2011.09.012     Document Type: Article

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