Physical parameters affecting deposition rates of binary alloys in a magnetron sputtering system

Vacuum

Volumn 49, Issue 2, 1998, Pages 153-160

  Habib, S K ^a   Rizk, A ^a   Mousa, I A ^a  

^a Ain Shams University   (Egypt)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; MAGNETRON SPUTTERING; NITROGEN; THIN FILMS; X RAY ANALYSIS;

DEPOSITION RATES; PHYSICAL PARAMETERS;

BINARY ALLOYS;

EID: 0031988549     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00158-9     Document Type: Article

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