Refractive index control of silicon nitride films prepared by radio-frequency reactive sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 20, Issue 6, 2002, Pages 2137-2139

  Nayar, P S ^a  

^a University of California at Irvine   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MULTILAYERS; PARTIAL PRESSURE; REFRACTIVE INDEX; SILICON NITRIDE; SPUTTER DEPOSITION;

SUBSTRATE HOLDERS;

THIN FILMS;

EID: 0036863508     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1513637     Document Type: Article

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