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Plasma Sources Science and Technology

Volumn 11, Issue 1, 2002, Pages 91-96

Target surface condition during reactive glow discharge sputtering of copper

(3) Depla, D a Haemers, J a De Gryse, R a

a GHENT UNIVERSITY (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CATHODES; COPPER; GLOW DISCHARGES; NITROGEN; PLASMA THEORY; PLASMAS; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

ARGON NITROGEN PLASMA; REACTIVE GLOW DISCHARGE SPUTTERING; TARGET SURFACE CONDITION;

MAGNETRON SPUTTERING;

EID: 0036465998 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/11/1/311 Document Type: Article

Times cited : (25)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.