Effect of sputtering-gas pressure on properties of silicon nitride films produced by helicon plasma sputtering

Thin Solid Films

Volumn 384, Issue 1, 2001, Pages 46-52

  Li, Wei Tang ^a   McKenzie, David R ^a   McFall, William D ^a   Zhang, Qi Chu ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; HYDROGEN; OXYGEN; PLASMAS; PRESSURE EFFECTS; SILICON NITRIDE; SPUTTERING; THIN FILMS;

HELICON PLASMAS; RADIO FREQUENCY REACTIVE SPUTTERING;

DIELECTRIC FILMS;

EID: 0035281494     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01695-3     Document Type: Article

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