Composition depth profile analysis of electrodeposited alloys and metal multilayers: the reverse approach

Journal of Solid State Electrochemistry

Volumn 15, Issue 11-12, 2011, Pages 2523-2544

  Neuróhr, Katalin ^a   Csik, Attila ^a   Vad, Kálmán ^a   Bartók, András ^a   Molnár, György ^a   Péter, László ^a  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

Alloy formation; Depth profile analysis; Electrodeposition; Multilayers

Indexed keywords

ALLOY FORMATION; CO/CU MULTILAYERS; COMPOSITION CHANGES; COMPOSITION DEPTH PROFILES; COMPOSITION PROFILE; CONVENTIONAL SPUTTERING; COVER LAYERS; DEPOSIT THICKNESS; DEPTH-PROFILE ANALYSIS; ELECTRODEPOSITED ALLOYS; ELECTRODEPOSITED MULTILAYERS; METAL MULTILAYERS; OSCILLATION INTENSITY; SAMPLE PREPARATION TECHNIQUES;

ALLOYS; CADMIUM ALLOYS; COPPER ALLOYS; DEPOSITS; ELECTRODEPOSITION; MULTILAYERS; TIN;

CERIUM ALLOYS;

EID: 84855524287     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-011-1465-x     Document Type: Review

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