Depth profile characterization of electrodeposited multi-thin-film structures by low angle of incidence X-ray diffractometry

Thin Solid Films

Volumn 489, Issue 1-2, 2005, Pages 86-93

  Nauer, M ^a   Ernst, K ^b   Kautek, W ^a,c   Neumann Spallart, M ^b  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^b Centre National de la Recherche Scientifique   (France)

^c UNIVERSITY OF VIENNA   (Austria)

Author keywords

Depth profiling; Multilayers; Secondary ion mass spectrometry (SIMS); X ray diffraction

Indexed keywords

ELECTRODEPOSITION; LIGHT ABSORPTION; MULTILAYERS; PHOTOVOLTAIC EFFECTS; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTALS; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

BANDGAP; DEPTH PROFILING; OFF-NORMAL ANGLE; SPRAY ANGLE;

THIN FILMS;

EID: 23144433022     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.05.008     Document Type: Article

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