AES and RBS characterization of anodic oxide films on Al-Ta amorphous alloys

Zeitschrift fur Physikalische Chemie

Volumn 219, Issue 11, 2005, Pages 1461-1479

  Werner, Z ^a,c   Jaskiewicz, A ^a,b   Pisarek, M ^a,b   Janik Czachor, M ^a   Barlak, M ^c  

^a POLISH ACADEMY OF SCIENCES   (Poland)

^b WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^c SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

Author keywords

Al Ta Alloys; Amorphous Alloys; Anodic Films

Indexed keywords

ALUMINA; ALUMINUM ALLOYS; ALUMINUM OXIDE; AMORPHOUS ALLOYS; ANODIC OXIDATION; BINARY ALLOYS; OXIDE FILMS; REFRACTORY METALS; SODIUM CHLORIDE;

AL-BASED AMORPHOUS ALLOYS; ALLOY COMPOSITIONS; ANODIC FILMS; ANODIC OXIDE FILM; BREAKDOWN POTENTIAL; CONCENTRATION RANGES; ELECTROCHEMICAL METHODS; EXPERIMENTAL CONDITIONS;

TANTALUM ALLOYS;

EID: 28444487199     PISSN: 09429352     EISSN: None     Source Type: Journal    
DOI: 10.1524/zpch.2005.219.11.1461     Document Type: Article

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