Application of surface roughness data for the evaluation of depth profile measurements of nanoscale multilayers

Journal of the Electrochemical Society

Volumn 156, Issue 7, 2009, Pages

  Bartók, András ^a   Csik, Attila ^a   Vad, Kálmán ^a   Molnár, György ^b   Tóth Kádár, Enik ^a   Ṕter, László ^a  

^a INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

^b RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; BI-LAYER; CO/CU MULTILAYERS; CONVENTIONAL SPUTTERING; DEPTH PROFILE; DEPTH-PROFILE ANALYSIS; INTENSITY FLUCTUATIONS; LAYER STRUCTURES; NANOSCALE MULTILAYERS; NEUTRAL MASS; ROUGHNESS EVOLUTION; THICKNESS FLUCTUATIONS;

ATOMIC FORCE MICROSCOPY; DEPOSITS; DEPTH PROFILING; MEASUREMENTS; METAL ANALYSIS; SURFACE PROPERTIES; SURFACE ROUGHNESS;

MULTILAYERS;

EID: 65949084244     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3133182     Document Type: Article

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