Electrodeposition and characterization of Fe80Ga20 alloy films

Electrochimica Acta

Volumn 56, Issue 14, 2011, Pages 5178-5183

  Iselt, D ^a,b   Gaitzsch, U ^a   Oswald, S ^a   Fahler S ^a   Schultz, L ^a,b   Schlorb H ^a  

^a IFW DRESDEN   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Electrodeposition; Fe100 xGax; Galfenol; Magnetostriction; Thin film

Indexed keywords

ALLOY FILM; ELECTRODEPOSITED FILMS; FE100-XGAX; GALFENOL; HIGH QUALITY; HOMOGENEOUS FILMS; LOW OXYGEN; MAXIMUM VALUES; OPTIMUM DEPOSITION; OXYGEN CONTENT; POTENTIAL DEPOSITION; POTENTIOSTATICS; REPRODUCIBILITIES; SI SUBSTRATES;

CERIUM ALLOYS; ELECTRODEPOSITION; GALLIUM; GOLD COATINGS; IRON ALLOYS; MAGNETOSTRICTION; MAGNETOSTRICTIVE DEVICES; MECHANICAL PROPERTIES; OXYGEN; PLATINUM; SATURATION MAGNETIZATION;

GALLIUM ALLOYS;

EID: 79956369876     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2011.03.046     Document Type: Article

References (29)

1. B.D. Cullity, and C.D. Graham Introduction to Magnetic Materials 2009 John Wiley and Sons Inc. NJ
2. A.E. Clark, M. Wun-Fogle, J.B. Restorff, K.W. Dennis, T.A. Lograsso, and R.W. McCallum J. Appl. Phys. 97 2005 10M316
3. E.M. Summers, T.A. Lograsso, and M. Wun-Fogle J. Mater. Sci. 42 2007 9582 9594
4. A. Javed, N.A. Morley, and M.R.J. Gibbs J. Magn. Magn. Mater. 321 2009 2877 2882
5. C. Mudivarthi, M. Laver, J. Cullen, A.B. Flatau, and M. Wuttig J. Appl. Phys. 107 9 2010 A957
6. R.C. Hall J. Appl. Phys. 30 1959 816 819
7. R.C. Hall J. Appl. Phys. 31 1960 1037 1038
8. A.E. Clark, J.B. Restorff, M. Wun-Fogle, T.A. Lograsso, and D.L. Schlagel IEEE Trans. Magn. 36I 2000 3238 3240
9. R.R. Basantkumar, B.J.H. Stadler, W.P. Robbins, and E.M. Summers IEEE Trans. Magn. 42 2006 3102 3104
10. P.D. McGary, L.W. Tan, J. Zou, B.J.H. Stadler, P.R. Downey, and A.B. Flatau J. Appl. Phys. 99 2006 308 310
11. H.M. Schurter, Y. Zhang, R. Wu, and A.B. Flatau Proc. SPIE 7289 2009 72891Y
12. C. Wenzel, B. Adolphi, U. Merkel, A. Jahn, U. Marschner, J. Ziske, H. Neubert, and W.-J. Fischer Sens. Actuators A 156 2009 129 133
13. P.R. Downey, A.B. Flatau, P.D. McGary, and B.J.H. Stadler Proc. SPIE 6932 2008 69320P
14. S. Armyanov Electrochim. Acta 45 2000 3323 3335
15. T.A. Lograsso, A.R. Ross, D.L. Schlagel, A.E. Clark, and M. Wun-Fogle J. Alloys Compd. 305 2003 95 101
16. J.R. Cullen, A.E. Clark, M. Wun-Fogle, J.B. Restorff, and T.A. Lograsso J. Magn. Magn. Mater. 226 2001 948 949
17. R.A. Kellogg, A.M. Russell, T.A. Lograsso, A.B. Flatau, A.E. Clark, and M. Wun-Fogle Acta Mater. 52 2004 5043 5050
18. A. Butera, J. Gómez, J.A. Barnard, and J.L. Weston Physica B 384 2006 262 264
19. R.A. Dunlap, J.D. McGraw, and S.P. Farrell J. Magn. Magn. Mater. 305 2006 315 320
20. B.W. Wang, S.Y. Li, Y. Zhou, W.M. Huang, and S.Y. Cao J. Magn. Magn. Mater. 320 2008 769 773
21. B. Adolphi, J. McCord, M. Bertram, C.-G. Oertel, U. Merkel, U. Marschner, R. Schäfer, C. Wenzel, and W.-J. Fischer Smart Mater. Struct. 19 2010 055013
22. E. Reichel Fresenius J. Anal. Chem. 87 1932 321 332
23. W.M. Saltman, and N.H. Nachtrieb J. Electrochem. Soc. 100 1953 126 130
24. D.O. Flamini, S.B. Saidman, and J.B. Bessone J. Appl. Electrochem. 37 2007 467 471
25. A. Brenner Electrodeposition of Alloys 1963 Academic Press Inc. NY
26. P.D. McGary, and B.J.H. Stadler J. Appl. Phys. 97 2005 10R503
27. N. Lupu, H. Chiriac, and P. Pascariu J. Appl. Phys. 103 07 2008 B511
28. N. Lupu, P. Pascariu, C. Gherasim, and H. Chiriac IEEE Trans. Magn. 44 2008 3005 3008
29. P.D. McGary, K.S.M. Reddy, G.D. Haugstad, and B.J.H. Stadler J. Electrochem. Soc. 157 2010 D656 D665