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Volumn 255, Issue 11, 2009, Pages 5795-5801

Electrodeposition of CoWP film. V. Structural and morphological characterisations

Author keywords

Barrier layer; Coating; CoWP film; Electrodeposition; Microelectronic devices

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; COATINGS; CRYSTALLINE MATERIALS; ELECTRODEPOSITION; ELECTRODES; METAL COATINGS; MICROELECTRONICS; PHOSPHORUS; SILICON COMPOUNDS; SILICON WAFERS; SODIUM; SULFUR COMPOUNDS; TUNGSTEN COMPOUNDS; VANADIUM COMPOUNDS;

EID: 60949110304     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.01.007     Document Type: Article
Times cited : (20)

References (62)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.