SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 6, 2011, Pages

Dielectric performance of hybrid alumina-silicone nanolaminates synthesized by plasma enhanced chemical vapor deposition

(3) Patel, Rakhi P a Chiavetta, David a Wolden, Colin A a

a Department of Geology and Geological Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA LAYERS; ALUMINA SYNTHESIS; CURRENT-VOLTAGE MEASUREMENTS; DIELECTRIC PERFORMANCE; DIGITAL CONTROL; EFFECTIVE DIELECTRIC CONSTANTS; ELECTRICAL FIELD; EXCELLENT PERFORMANCE; FIELD STRENGTHS; HEXAMETHYL DISILOXANE; LOW TEMPERATURES; NANO-LAMINATES; NANOLAMINATE STRUCTURES; PARENT COMPOUNDS; SPECIFIC CAPACITANCE; TRIMETHYL ALUMINUMS;

ALUMINA; CHEMICAL VAPOR DEPOSITION; DIGITAL CONTROL SYSTEMS; PLASMA DEPOSITION; SILICONES; SPECTROSCOPIC ELLIPSOMETRY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 84255199738 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3652918 Document Type: Article

Times cited : (14)

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