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Volumn 29, Issue 2, 2011, Pages

Plasma-enhanced chemical vapor deposition synthesis of silica-silicone nanolaminates using a single precursor

Author keywords

[No Author keywords available]

Indexed keywords

DIGITAL CONTROL; FLEXIBLE SUBSTRATE; HEXAMETHYL DISILOXANE; HIGH-POWER; NANO-LAMINATES; NANOLAMINATE STRUCTURES; ORGANIC CONTENT; PLASMA POWER; POLYMER SUBSTRATE; RF-POWER; ROOM TEMPERATURE; SINGLE PRECURSORS;

EID: 79952390915     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3553149     Document Type: Article
Times cited : (12)

References (35)
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    • (2001) Adv. Funct. Mater. , vol.11 , pp. 15
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  • 2
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    • 0079-6700, 10.1016/j.progpolymsci.2007.11.004
    • M. C. Choi, Y. Kim, and C. S. Ha, Prog. Polym. Sci. 0079-6700 33, 581 (2008). 10.1016/j.progpolymsci.2007.11.004
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    • Choi, M.C.1    Kim, Y.2    Ha, C.S.3
  • 27
    • 0034817575 scopus 로고    scopus 로고
    • Structure and properties of silicon oxide films deposited in a dual microwave-rf plasma reactor
    • DOI 10.1016/S0040-6090(00)01870-8
    • N. Benissad, K. Aumaille, A. Granier, and A. Goullet, Thin Solid Films 0040-6090 384, 230 (2001). 10.1016/S0040-6090(00)01870-8 (Pubitemid 32875147)
    • (2001) Thin Solid Films , vol.384 , Issue.2 , pp. 230-235
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  • 30
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    • The role of oxygen dissociation in plasma enhanced chemical vapor deposition of zinc oxide from oxygen and diethyl zinc
    • DOI 10.1007/s11090-004-8841-6
    • C. A. Wolden, Plasma Chem. Plasma Process. 0272-4324 25, 169 (2005). 10.1007/s11090-004-8841-6 (Pubitemid 40536318)
    • (2005) Plasma Chemistry and Plasma Processing , vol.25 , Issue.2 , pp. 169-192
    • Wolden, C.A.1
  • 35
    • 13544259053 scopus 로고    scopus 로고
    • 2 glasses with excessive and deficient oxygen
    • DOI 10.1016/0921-4526(95)00718-0
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    • (1996) Physica B: Condensed Matter , vol.219-220 , Issue.1-4 , pp. 276-278
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.