Low dielectric constant insulator formed by downstream plasma CVD at room temperature using TMS/O2

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 3 SUPPL. B, 1997, Pages 1477-1480

  Nara, Akiko ^a   Itoh, Hitoshi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CVD; Dielectric constant; FT IR; Insulator; Thermal stability

Indexed keywords

EID: 0000710147     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.1477     Document Type: Article

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