Silicon oxide films from the Plasmodul

Vacuum

Volumn 57, Issue 4, 2000, Pages 387-397

  Walker, M ^a   Baumgartner K M ^a   Feichtinger, J ^a   Kaiser, M ^b   Schulz, A ^a   Rauchle E ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

^b FRAUNHOFER INSTITUTE FOR CHEMICAL TECHNOLOGY ICT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; SUBSTRATES;

HEXAMETHYLDISILOXANE;

SEMICONDUCTING FILMS;

EID: 17344384564     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00152-4     Document Type: Article

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