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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 949-955

Single-chamber plasma enhanced chemical vapor deposition of transparent organic/inorganic multilayer barrier coating at low temperature

(4) Park, S M a Kim, D J a Kim, S I a Lee, N E a

a Sungkyunkwan University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AERODYNAMICS; ARGON; CARBON FILMS; CLADDING (COATING); DEPOSITION RATES; DIFFUSION COATINGS; FLOW OF GASES; GAS DYNAMICS; GAS PERMEABLE MEMBRANES; HYDROGEN; METALLIZING; MOLECULAR BEAM EPITAXY; MULTILAYER FILMS; MULTILAYERS; OXYGEN; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; PLASTIC COATINGS; POLYETHYLENE TEREPHTHALATES; VAPORS; WATER VAPOR;

(CO/PT) MULTILAYERS; (E ,3E) PROCESS; BARRIER COATINGS; CARBON AND HYDROGEN (CH); CHEMICAL VAPOR DEPOSITION (CVD) REACTORS; CHEMICAL VAPORS; DEPOSITION METHODS; DEPOSITION SYSTEMS; DIFFUSION BARRIER COATINGS; GAS FLOW RATIO; LOW TEMPERATURE (LTR); LOW TEMPERATURE PLASMA (LTP); METHYLCYCLOHEXANE (MCH); MULTI LAYER COATINGS; MULTILAYER (ML); MULTILAYER STACKING; ORGANIC-INORGANIC; OXYGEN CONCENTRATIONS; PROCESS STEPS; RF PLASMA POWER; WATER VAPOR TRANSMISSION RATE (WVTR);

VAPOR DEPOSITION;

EID: 46449131660 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2940348 Document Type: Article

Times cited : (7)

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