Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 516, Issue 6, 2008, Pages 1290-1296

  Cibert, C ^a   Hidalgo, H ^a   Champeaux, C ^a   Tristant, P ^a   Tixier, C ^a   Desmaison, J ^a   Catherinot, A ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

Aluminum oxide; PECVD; PLD; Thin films properties

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; NANOCRYSTALLINE MATERIALS; OPTICAL PROPERTIES; PERMITTIVITY; PULSED LASER DEPOSITION;

ALUMINUM OXIDE; NANO CRYSTALLIZED STRUCTURES; OPTICAL FIELDS; THIN FILMS PROPERTIES;

THIN FILMS;

EID: 37349043733     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.05.064     Document Type: Article

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