Self-limiting deposition of anatase TiO2 at low temperature by pulsed PECVD

Electrochemical and Solid-State Letters

Volumn 12, Issue 7, 2009, Pages

  Kubala, Nicholas G ^a   Rowlette, Pieter C ^a   Wolden, Colin A ^a  

^a Department of Metallurgical and Materials Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; ANATASE STRUCTURES; ANATASE TIO; FOURIER TRANSFORM INFRARED; LOW TEMPERATURES; PLASMA POWER; PULSED PLASMA; X-RAY DIFFRACTION MEASUREMENTS;

AMORPHOUS FILMS; CHLORINE; MAGNETIC FILMS; MOLECULAR BEAM EPITAXY; PHASE TRANSITIONS; PLASMA DEPOSITION; PLASMAS; SPECTROSCOPIC ELLIPSOMETRY; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 69149102477     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3125287     Document Type: Article

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