Self-limiting growth of tantalum oxide thin films by pulsed plasma-enhanced chemical vapor deposition

Applied Physics Letters

Volumn 90, Issue 13, 2007, Pages

  Seman, Michael ^a,b   Bobbins, Joshua J ^b   Agarwal, Sumit ^a   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

^b CMD Research LLC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GAS ACTUATION; METAL PRECURSORS;

ATOMIC LAYER DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; TANTALUM COMPOUNDS;

THIN FILMS;

EID: 34047163999     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2716310     Document Type: Article

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