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Volumn 26, Issue 5, 2008, Pages 1213-1217

Enhancement of metal oxide deposition rate and quality using pulsed plasma-enhanced chemical vapor deposition at low frequency

Author keywords

[No Author keywords available]

Indexed keywords

LOW FREQUENCIES; REACTOR DESIGNS; SQUARE WAVE;

EID: 50849102613     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2966425     Document Type: Article
Times cited : (17)

References (33)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.