High-resolution permanent photoresist laminate TMMF for sealed microfluidic structures in biological applications

Journal of Micromechanics and Microengineering

Volumn 21, Issue 9, 2011, Pages

  Wangler, N ^a   Gutzweiler, L ^a   Kalkandjiev, K ^a   Muller C ^a   Mayenfels, F ^a   Reinecke, H ^a,b   Zengerle, R ^a,b   Paust, N ^b  

^a UNIVERSITY OF FREIBURG   (Germany)

^b Institute for Micromachining and Information Technology   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BIOLOGICAL APPLICATIONS; CLEANING SOLUTION; DRY-FILM PHOTORESISTS; FREE-STANDING STRUCTURES; HIGH RESOLUTION; MICROFLUIDIC CHANNEL; MICROFLUIDIC STRUCTURES; MINIMUM FEATURE SIZES; OR CHANNELS; PHOTOSENSITIVE EPOXY; POSTEXPOSURE BAKE; PROCESS PARAMETERS; SEALED CAVITIES; STRUCTURED SUBSTRATE; THERMAL IMPACTS; THICK RESIST; TOTAL THICKNESS VARIATIONS;

FABRICATION; FLUIDIC DEVICES; ION BEAMS; LAMINATING; MICROFLUIDICS; PHOTORESISTS;

ASPECT RATIO;

EID: 80052222352     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/21/9/095009     Document Type: Article

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