3D microfabrication by combining microstereolithography and thick resist UV lithography

Sensors and Actuators, A: Physical

Volumn 73, Issue 1-2, 1999, Pages 14-23

  Bertsch, A ^a   Lorenz, H ^a   Renaud, P ^a  

^a EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYSTAL MICROSTRUCTURE; PHOTOPOLYMERIZATION; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTING POLYMERS; SEMICONDUCTING SILICON; ULTRAVIOLET RADIATION;

HIGH ASPECT RATIO STRUCTURATION; MICROSTEREOLITHOGRAPHY;

MICROSENSORS;

EID: 0033537535     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00249-0     Document Type: Article

References (15)

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